Ion beam sputtering, known as potential technique for producing nanoripple on various
surfaces having wide range of applications. Along with nanoripple, triangular features are …

The dynamics of the pattern induced on a silicon surface by oblique incidence of a 40 keV
Fe ion beam is studied. The results are compared with those obtained for two reference …

The dynamical characteristics of surface nanopatterning using low-energy ion beams
remains a central theme within ion beam sputtering. Most previous studies have focused on …

Reactive ion beam etching is a key technology in the field of ultra-precise surface
engineering. In this process nanopatterns can emerge and alter the functional properties of …

Low energy ion beam-induced nanoscale ripple patterns have attracted attention due to
their use in various technological applications. Making defect free, highly regular, and low …

The nanoscale patterns produced by bombardment of the (100) surface of silicon with a 2
keV Kr ion beam are investigated both experimentally and theoretically. In our experiments …

The plasmonic sensors based on silver nanoparticles are limited in application due to their
relatively fast degradation in the ambient atmosphere. The technology of ion-beam …

Ion beam sputtering (IBS) can induce nanoripple patterns in a short time on variety of
materials for wide range of applications. In this work, we describe the nanoripple as well as …

Regular wave patterns were created by a 2 kV gallium ion on Si (111) monocrystals at
incidence angles between 60° and 80° with respect to the surface normal. The characteristic …

It is demonstrated that the quality of nanoscale triangular structures on Si (100) surfaces can
be improved by applying intermittent ion beam sputtering. This investigation is conducted …