Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …

Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …

Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to
enable the continued miniaturization of semiconductor devices. The required EUV light, at …

We experimentally and numerically investigate the early-time hydrodynamic response of tin
microdroplets driven by a ns-laser-induced plasma. Experimentally, we use stroboscopic …

We present the results of a joint experimental and theoretical study of plasma expansion
arising from Nd: YAG laser ablation (laser wavelength λ= 1.064 μm) of tin microdroplets in …

We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …

We present results from a combined experimental and numerical simulation study of the
anisotropy of the expansion of a laser-produced plasma into vacuum. Plasma is generated …

We experimentally study the mass partitioning of a fragmenting liquid sheet formed after the
impact of a ns-laser pulse on a tin microdroplet, and its dependence on laser pulse energy …

The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …

We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by
laser wavelengths in the λ laser= 1.064− 10.6 μ m range and laser intensities of I laser= 0.5 …