In this work, an atomic-layer Fe 2 O 3-modified two-dimensional (2D) porphyrinic metal-
organic framework (MOF) was prepared (2D MOF-Fe 2 O 3), which exhibits unique …

Titanium dioxide (TiO2) is one of the most technologically promising oxides with a broad
range of catalytic and photocatalytic activities. Theoretical modeling, especially density …

Atomic layer deposition (ALD) is a surface synthesis technique that is characterized by self-
limiting reactions between gas-phase precursors and a solid substrate. Although ALD …

Surface termination and interfacial interactions are critical for advanced solid-state quantum
applications. In this paper, we demonstrate that atomic layer deposition (ALD) can both …

Unique atomic arrangements (ie, defects) on material surfaces may exhibit distinctive
reactivity that affords opportunities for selective surface chemistry exclusively at those sites …

Anatase TiO2 nanoparticles support a subtle diversity of surface aqua and hydroxy
coordination environments that are characteristic of distinct facets and defect sites. The …

Routes to area-and especially site-selective atomic layer deposition (ALD) remain an
enticing challenge in precision surface science, despite the potentially game-changing …

As semiconductor devices become miniaturized, the importance of the molecular-level
understanding of the fabrication processes is growing. Titanium nitride (TiN) is an important …

In situ pyroelectric calorimetry and spectroscopic ellipsometry were used to investigate
surface reactions in atomic layer deposition (ALD) of zirconium oxide (ZrO2). Calibrated and …

While atomic layer deposition (ALD) processes from across the periodic table have been
designed to deposit conformal thin films, an atomistic view of disparate substrate sites …