Commercial GaN-based power electronic systems: A review

BN Pushpakaran, AS Subburaj, SB Bayne - Journal of electronic materials, 2020 - Springer
Wide bandgap semiconductor technology is gaining widespread acceptance in the area of
high-power and high-temperature power electronics. Gallium nitride (GaN) not only has a …

Selective doping in silicon carbide power devices

F Roccaforte, P Fiorenza, M Vivona, G Greco… - Materials, 2021 - mdpi.com
Silicon carbide (SiC) is the most mature wide band-gap semiconductor and is currently
employed for the fabrication of high-efficiency power electronic devices, such as diodes and …

Electromechanical computing at 500 C with silicon carbide

TH Lee, S Bhunia, M Mehregany - Science, 2010 - science.org
Logic circuits capable of operating at high temperatures can alleviate expensive heat-
sinking and thermal-management requirements of modern electronics and are enabling for …

Ion implantation doping in silicon carbide and gallium nitride electronic devices

F Roccaforte, F Giannazzo, G Greco - Micro, 2022 - mdpi.com
Wide band gap semiconductors such as silicon carbide (SiC) and gallium nitride (GaN) are
excellent materials for the next generation of high-power and high-frequency electronic …

Enhanced Inversion Mobility on 4H-SiC Using Phosphorus and Nitrogen Interface Passivation

G Liu, AC Ahyi, Y Xu, T Isaacs-Smith… - IEEE Electron …, 2013 - ieeexplore.ieee.org
Low interface trap density and high channel mobility on nonpolar faces of 4H-SiC, such as
the (11 [2̅] 0) a-face, are of fundamental importance in the understanding of SiC MOS …

Nanoscale transport properties at silicon carbide interfaces

F Roccaforte, F Giannazzo… - Journal of Physics D …, 2010 - iopscience.iop.org
Wide bandgap semiconductors promise devices with performances not achievable using
silicon technology. Among them, silicon carbide (SiC) is considered the top-notch material …

A review of silicon carbide CMOS technology for harsh environments

H Wang, P Lai, MZ Islam, ASMK Hasan… - Materials Science in …, 2024 - Elsevier
A comprehensive overview of the advancements, challenges, and prospects of silicon
carbide (SiC) complementary metal-oxide-semiconductor (CMOS) technology is presented …

4H‐SiC MISFETs with nitrogen‐containing insulators

M Noborio, J Suda, S Beljakowa… - … status solidi (a), 2009 - Wiley Online Library
Abstract 4H‐SiC MISFETs with nitrogen‐containing insulators have been fabricated and
characterized. Several techniques have been explored to incorporate nitrogen in the gate …

Time-dependent dielectric breakdown of gate oxide on 4H-SiC with different oxidation processes

BY Tsui, YT Huang, TL Wu, CH Chien - Microelectronics Reliability, 2021 - Elsevier
Abstract Effects of oxidation and nitric oxide (NO) post-oxidation annealing (POA) processes
on the gate oxide integrity on 4H-SiC are investigated. Interface state density, flatband …

A study on pre-oxidation nitrogen implantation for the improvement of channel mobility in 4H-SiC MOSFETs

S Dhar, SH Ryu, AK Agarwal - IEEE Transactions on Electron …, 2010 - ieeexplore.ieee.org
Detailed investigations on the pre-oxidation nitrogen implantation process for the
improvement of channel mobility in 4H-SiC MOSFETs are reported. Comparisons with …