This review addresses resistive switching devices operating according to the bipolar valence change mechanism (VCM), which has become a major trend in electronic materials …
The resistive switching effect in memristors typically stems from the formation and rupture of localized conductive filament paths, and HfO2 has been accepted as one of the most …
F Palumbo, C Wen, S Lombardo… - Advanced Functional …, 2020 - Wiley Online Library
Thin dielectric films are essential components of most micro‐and nanoelectronic devices, and they have played a key role in the huge development that the semiconductor industry …
S Starschich, S Menzel, U Böttger - Applied Physics Letters, 2016 - pubs.aip.org
The wake-up effect which is observed in ferroelectric hafnium oxide is investigated in yttrium doped hafnium oxide prepared by chemical solution deposition. It can be shown that not the …
Graphene and related materials (GRMs) are promising candidates for the fabrication of resistive random access memories (RRAMs). Here, this emerging field is analyzed …
Metal-Insulator-Metal (MIM) structures have raised as the most promising configuration for next generation information storage, leading to great performance and fabrication-friendly …
The discovery of ferroelectricity in polycrystalline thin films of doped HfO2 has reignited the expectations of developing competitive ferroelectric non-volatile memory devices. To date, it …
Y Li, S Long, Q Liu, H Lv, M Liu - Small, 2017 - Wiley Online Library
Reversible chemical and structural changes induced by ionic motion and reaction in response to electrical stimuli leads to resistive switching effects in metal‐insulator‐metal …
A Padovani, L Larcher, O Pirrotta… - … on electron devices, 2015 - ieeexplore.ieee.org
We propose a model describing the operations of hafnium oxide-based resistive random access memory (RRAM) devices at the microscopic level. Charge carrier and ion transport …