Dark current and 1/f noise characteristics of In0. 74Ga0. 26As photodiode passivated by SiNx/Al2O3 bilayer

L Wan, X Shao, Y Ma, S Deng, Y Liu, J Cheng… - Infrared Physics & …, 2020 - Elsevier
This study is focusing on dark current and 1/f noise characteristics of In 0.74 Ga 0.26 As
photodiode passivated with different passivation films. With regard to mesa-type wavelength …

[PDF][PDF] Light-Induced Dielectrophoresis for Characterizing the Electrical Behavior of Human Mesenchymal Stem Cells

KL Lacy, S Salib, M Tran, T Tsai, R Valentine… - Journal of Visualized …, 2023 - par.nsf.gov
Human mesenchymal stem cells (hMSCs) offer a patient-derived cell source for conducting
mechanistic studies of diseases or for several therapeutic applications. Understanding …

Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In0. 83Ga0. 17As photodiodes

M Shi, X Shao, H Tang, T Li, Y Wang, X Li… - Infrared Physics & …, 2014 - Elsevier
Silicon nitride films (SiN x) deposited by ICPCVD (inductively coupled plasma chemical
vapor deposition) at lower temperature (75° C) are investigated on extended wavelength In …

Interface property of silicon nitride films grown by inductively coupled plasma chemical vapor deposition and plasma enhanced chemical vapor deposition on In0 …

M Shi, H Tang, X Shao, X Huang, G Cao… - Infrared Physics & …, 2015 - Elsevier
Abstract Au/silicon nitride/In 0.82 Al 0.18 As metal insulating semiconductor (MIS) capacitors
were fabricated and then investigated by capacitance voltage (C–V) test at variable …

High-Temperature Thermoelectric Characterization of III–V Semiconductor Thin Films by Oxide Bonding

JH Bahk, G Zeng, JMO Zide, H Lu, R Singh… - Journal of electronic …, 2010 - Springer
A device fabrication and measurement method utilizing a SiO 2–SiO 2 covalent bonding
technique is presented for high-temperature thermoelectric characterization of thin-film III–V …

Anneal treatment to improve the performance of extended wavelength In0. 83Ga0. 17As photodetectors

P Li, T Li, S Deng, X Li, X Shao, H Tang… - Infrared Physics & …, 2015 - Elsevier
For the purposes of improving the performance of the SWIR detector, two types of annealing
treatment for extended wavelength In 0.83 Ga 0.17 As photodiodes with PIN structure are …

Surface and optical properties of silicon nitride deposited by inductively coupled plasma-chemical vapor deposition

Y Zhu, X Chen, Y Ma, Y Zhang, B Du… - Journal of …, 2018 - iopscience.iop.org
The surface and optical properties of silicon nitride samples with different compositions were
investigated. The samples were deposited on InP by inductively coupled plasma chemical …

Duty ratio-controlled surface oughness of silicon nitride film deposited using room-temperature SiH4−NH3−N2 Plasma

D Kim, B Kim, YH Seo - Electronic Materials Letters, 2010 - Springer
Silicon nitride films were deposited with mixed gasses of SiH 4-NH 3-N 2 using a pulsed,
plasma-enhanced chemical vapor deposition system at room temperature. The surface …

Increase in electron mobility of InGaAs/InP composite channel high electron mobility transistor structure due to SiN passivation

Y Liu, H Wang, K Radhakrishnan - Thin solid films, 2007 - Elsevier
The influence of silicon nitride passivation on electron mobility of InGaAs/InP composite
channel high electron mobility transistor structure has been studied. Different from the …

Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

S Kim, B Kim - Thin solid films, 2010 - Elsevier
Using a pulsed-plasma enhanced chemical vapor deposition system, silicon nitride films
were deposited at room temperature. A refractive index was examined in the range of bias …