This paper presents a comprehensive review of recent advancements in surface
engineering of metals, encompassing techniques, characterization methods and …

Metal-assisted chemical etching (MacEtch) has emerged as a versatile technique for
fabricating a variety of semiconductor nanostructures. Since early investigations in 2000 …

Using photoluminescence and Raman spectroscopy, as well as high-resolution
transmission microscopy and X-ray diffraction, germanium nanowires obtained by cathodic …

Engineering of functional groups is a promising way to optimize the structure and facilitate
photocatalytic H 2 O 2 production of covalent organic frameworks (COFs), and hydrophilic …

Metal-Assisted Chemical Etching (MACE) is a technique for precisely forming
nanostructures on semiconductor substrates, and it is actively researched in various fields …

We utilized graphene oxide (GO) flakes as a starting material to conduct nanocarbon (NC)-
assisted chemical etching of Ge (1 0 0) surfaces in H 2 O 2 solutions. Upon initial etching in …

Fs-laser irradiation is a promising fabrication method for future broadband optoelectronic
applications as it creates antireflective micro-and nanoscale structures on semiconductor …

Potassium hydroxide (KOH) aqueous solutions can effectively etch germanium. Etch rates
were determined in an electrolytic etch cell. Electrically isolated Ge wafers were subject to …