Carbon nanotubes (CNTs) produced by the floating‐catalyst chemical vapor deposition
(FCCVD) method are among the most promising nanomaterials of today, attracting interest …

Nanomaterials are driving advances in technology due to their oftentimes superior
properties over bulk materials. In particular, their thermal properties become increasingly …

EUV lithography has been adopted worldwide for High-Volume Manufacturing (HVM) of sub-
10nm node semiconductors. To support HVM, EUV pellicles were introduced by ASML in …

EUV lithography has been adopted worldwide for High-Volume Manufacturing (HVM) of sub-
10nm node semiconductors. To support HVM, EUV pellicles were introduced by ASML in …

Background: Reliable photomask metrology is required to reduce the risk of yield loss in the
semiconductor manufacturing process as well as for the research on absorber materials …

EUV lithography wafer production has begun and consequently maximizing yield gains
importance. One key component to high-yield lithography in manufacturing is using a …

EUV lithography has been implemented in high volume wafer production. Consequently,
maximizing yield is of major importance. One key component to achieve optimal yield is …

Reliable photomask metrology is required to reduce the risk of yield loss in the
semiconductor manufacturing process. Actinic pattern inspection (API) of EUV reticles is a …

In this paper, we present the first results from an investigation performed on nanometric thin
pellicles based on carbon nanotubes (CNT) of potential interest for manufacturing large area …

EUV lithography has recently been implemented in high volume wafer production.
Consequently, maximizing yield is gaining importance. One key component to achieve …