Recent advances in Schottky barrier concepts

RT Tung - Materials Science and Engineering: R: Reports, 2001 - Elsevier
Theoretical models of Schottky-barrier height formation are reviewed. A particular emphasis
is placed on the examination of how these models agree with general physical principles …

Ohmic contacts to GaAs epitaxial layers

TJ Kim, PH Holloway - Critical Reviews in Solid State and Material …, 1997 - Taylor & Francis
Formation of ohmic contacts onto GaAs epitaxial layers was reviewed. Because the Fermi
energy of GaAs is pinned at the surface near the middle of the bandgap, it is impossible to …

Non-alloyed Ohmic contacts to n-GaAs using compositionally graded InxGa1-xAs layers

T Nittono, H Ito, O Nakajima… - Japanese Journal of …, 1988 - iopscience.iop.org
Non-alloyed ohmic contacts to n-GaAs using compositionally graded In x Ga 1-x As layers
grown by molecular beam epitaxy are studied. The carrier concentration reduction in the …

The role of compound formation and heteroepitaxy in indium‐based ohmic contacts to GaAs

AA Lakhani - Journal of applied physics, 1984 - pubs.aip.org
Ohmic contacts to n‐GaAs formed by the heat treatment of In films have been investigated.
The widely‐accepted model for ohmic contact formation, involving the establishment of a …

Thermally stable Pd/Ge ohmic contacts to n‐type GaAs

J Tsuchimoto, S Shikata, H Hayashi - Journal of applied physics, 1991 - pubs.aip.org
The thermally stable Pd/Ge ohmic contacts to n‐type GaAs are obtained by a rapid thermal
annealing method. Compared to the conventional AuGe based ohmic metals, the surface …

Metallurgical behaviour of Ni/Au Ge ohmic contacts to GaAs

A Iliadis, KE Singer - Solid state communications, 1984 - Elsevier
Auger depth profiling and contact resistance measurements have been used to study
sintered Ni/Au/Au Ge and Ni/Au Ge contacts to GaAs. The results indicate that Ge …

Formation, microstructure et résistances des contacts Au Ge/n-GaAs, Au Ge/n-InP, Au Zn/p-InP et Au Be/p-InP

P Auvray, A Guivarc'h, H L'haridon, JP Mercier… - Thin Solid Films, 1985 - Elsevier
We have studied the metallurgy of the contacts Au Ge/n-GaAs (12 wt.% Ge), Au Ge/n-InP,
Au Zn/p-InP (12 wt.% Zn) and Au Be/p-InP (0.9 wt.% Be) between 320 and 450° C by …

Effect of annealing process parameters on the properties of AuGe ohmic contacts to GaAs

AK Kulkarni, JT Lukowski - Journal of applied physics, 1986 - pubs.aip.org
The control of the electrical and the structural properties of ohmic contacts to GaAs is
extremely important in the fabrication of GaAs devices. The annealing process parameters …

Study of the electrical, thermal and chemical properties of Pd ohmic contacts to p-type 4H-SiC: dependence on annealing conditions

L Kassamakova, R Kakanakov, N Nordell… - Materials Science and …, 1999 - Elsevier
The electrical and chemical properties of Pd ohmic contacts to p-type 4H-SiC, together with
their thermal stability, have been studied in the annealing temperature range 600–700° C …

High-performance AlGaAs/GaAs MODFET's with improved ohmic contacts

WL Jones, LF Eastman - IEEE Transactions on electron devices, 1986 - ieeexplore.ieee.org
Alloyed ohmic contacts based on AuGeNiAg metallization with transfer resistance from
ohmic metal to the 2DEG channel of less than 0.1 Ω mm have been fabricated on …