Reactions of some [C, N, O]-containing molecules with Si surfaces: experimental and theoretical studies

X Lu, MC Lin - International Reviews in Physical Chemistry, 2002 - Taylor & Francis
Mechanistic understanding of the reactions of small molecules containing C, N and O with Si
surfaces is not only fundamentally interesting but also practically important to the …

Silicon surfaces as electron acceptors: dative bonding of amines with Si (001) and Si (111) surfaces

X Cao, RJ Hamers - Journal of the American Chemical Society, 2001 - ACS Publications
The bonding of the trimethylamine (TMA) and dimethylamine (DMA) with crystalline silicon
surfaces has been investigated using X-ray photoelectron spectroscopy (XPS), Fourier …

Attaching organic layers to semiconductor surfaces

SF Bent - The Journal of Physical Chemistry B, 2002 - ACS Publications
Methods that can be used to tailor the surface properties of semiconductors will become
increasingly important as new applications for semiconductor-based materials continue to …

Methods for controlling dopant concentration and activation in semiconductor structures

EG Seebauer, RD Braatz, MYL Jung… - US Patent …, 2010 - Google Patents
(54) METHODS FOR CONTROLLING DOPANT 4,243,865 A 1/1981 Saxena
CONCENTRATION AND ACTIVATION IN 5,429,708 A* 7/1995 Linford et al................. 216.66 …

Control of morphology and orientation of ZnO thin films grown on SiO2/Si substrates

S Muthukumar, CR Gorla, NW Emanetoglu… - Journal of crystal …, 2001 - Elsevier
ZnO is a wide bandgap semiconductor possessing unique electrical, mechanical, and
optical properties. Piezoelectric ZnO film has a high electro-mechanical coupling coefficient …

The adsorption and decomposition of NH3 ON Si (100)—detection of the NH2 (a) species

MJ Dresser, PA Taylor, RM Wallace, WJ Choyke… - Surface science, 1989 - Elsevier
The dissociative adsorption of NH3 on Si (100)-(2× 1) has been studied using accurate
surface coverage measurements, temperature programmed desorption. Auger spectroscopy …

Use of multilayer techniques for XPS identification of various nitrogen environments in the Si/NH3 system

JL Bischoff, F Lutz, D Bolmont, L Kubler - Surface science, 1991 - Elsevier
The experimental ability to reach rapidly, under UHV and on the same substrate holder, the
high temperatures (1100 K) required for silicon surface reconstructions and the low …

Photoemission studies of the reactions of ammonia and N atoms with Si (100)-(2× 1) and Si (111)-(7× 7) surfaces

F Bozso, P Avouris - Physical Review B, 1988 - APS
We present results of detailed x-ray photoemission and ultraviolet photoemission
spectroscopic studies of the reactions of silicon with ammonia and atomic nitrogen. We show …

Competing interactions in molecular adsorption: NH3 on Si (001)

JHG Owen - Journal of Physics: Condensed Matter, 2009 - iopscience.iop.org
Ammonia is a good model system for the study of co-adsorption interactions, including
indirect effects such as charge and strain-induced local effects on adsorption sites, and …

Contrasted behavior of Si (001) and Si (111) surfaces with respect to NH3 adsorption and thermal nitridation: a N 1s and Si 2p core level study with synchrotron …

G Dufour, F Rochet, H Roulet, F Sirotti - Surface science, 1994 - Elsevier
The role of surface structure in controlling NH3 surface chemistry has been investigated by
N 1s and Si 2p core level photoemission on Si (001)-2× 1 and Si (111)-7× 7, taking …