Advancements in optical lithography tools, processes, and patterning materials have been
critical to the continued performance increases of semiconductor devices as well as to the …

Numerical imaging simulations demonstrate the capability of immersion lithography to print
features smaller than 45 nm (35 nm) with good depth of focus at a vacuum wavelength of …

Immersion lithography is a viable method for continuing the reduction in critical dimension.
Much of the improvement in image quality in immersion lithography centers around high-NA …

Immersion lithography has been proposed as a method for improving optical
microlithography resolution to 45 nm and below via the insertion of a high refractive index …

A simulation package has been developed for predicting the influence of immersion, ie the
presence of a uniform liquid layer between the last objective lens and the photoresist, on …

Immersion lithography has been proposed as a method of improving optical lithography
resolution to 50 nm and below, by increasing the index of refraction in the space between …

Immersion lithography has been proposed as a method for improving optical lithography
resolution to 50 nm. The premise behind the concept is to increase the index of refraction in …

Current optical lithography methods are nearing theoretical limits that prevent their use in
the production of circuits for future nodes. A proposed solution is to increase the index of …

Immersion lithography has been proposed as a method for improving optical lithography
resolution to 50 nm and below. The premise behind the concept is to increase the refraction …

Immersion lithography seeks to extend the resolution of optical lithography by filling the gap
between the final optical element and the wafer with a liquid characterized by a high index of …