X-ray scatterometry metrology for high aspect ratio structures
TG Dziura, AA Gellineau, AV Shchegrov - US Patent 10,352,695, 2019 - Google Patents
Methods and systems for characterizing dimensions and material properties of high aspect
ratio, vertically manufac tured devices using transmission, small-angle X-ray scatter ing (T …
ratio, vertically manufac tured devices using transmission, small-angle X-ray scatter ing (T …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2012 - Google Patents
Methods and systems for monitoring semiconductor fabrication processes are provided. A
system may include a stage configured to support a specimen and coupled to a …
system may include a stage configured to support a specimen and coupled to a …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2010 - Google Patents
Methods and systems for monitoring semiconductor fabrication processes are provided. A
system may include a stage configured to support a specimen and coupled to a …
system may include a stage configured to support a specimen and coupled to a …
Metrology tool with combined X-ray and optical scatterometers
MS Bakeman, AV Shchegrov - US Patent 10,801,975, 2020 - Google Patents
Methods and systems for performing simultaneous optical scattering and small angle x-ray
scattering (SAXS) measurements over a desired inspection area of a specimen are …
scattering (SAXS) measurements over a desired inspection area of a specimen are …
Methods and systems for determining a critical dimension and overlay of a specimen
A Levy, KA Brown, R Smedt, G Bultman… - US Patent …, 2013 - Google Patents
2012-05-09 Assigned to KLA-TENCOR TECHNOLOGIES CORPORATION reassignment
KLA-TENCOR TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS …
KLA-TENCOR TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS …
Measurement system optimization for X-ray based metrology
JJ Hench, AV Shchegrov, MS Bakeman - US Patent 10,324,050, 2019 - Google Patents
Methods and systems for optimizing measurement system parameter settings of an x-ray
based metrology system are presented. X-ray based metrology systems employing an …
based metrology system are presented. X-ray based metrology systems employing an …
Signal response metrology for image based and scatterometry overlay measurements
SI Pandev, D Sanko, W Lu, S Srivastava - US Patent 10,210,606, 2019 - Google Patents
Methods and systems for measuring overlay error between structures formed on a substrate
by successive lithographic processes are presented herein. Two overlay targets, each …
by successive lithographic processes are presented herein. Two overlay targets, each …
Metrology tool with combined XRF and SAXS capabilities
MS Bakeman, AV Shchegrov, K Peterlinz… - US Patent …, 2017 - Google Patents
Fluorescence (XRF) and small angle X-ray scattering (SAXS) measurements over a desired
inspection area of a specimen are presented. SAXS measurements combined with XRF …
inspection area of a specimen are presented. SAXS measurements combined with XRF …
Computationally efficient X-ray based overlay measurement
J Hench, AV Shchegrov, MS Bakeman - US Patent 10,545,104, 2020 - Google Patents
Methods and systems for performing overlay and edge placement errors of device structures
based on x-ray dif fraction measurement data are presented. Overlay error between different …
based on x-ray dif fraction measurement data are presented. Overlay error between different …
Signal response metrology based on measurements of proxy structures
AV Shchegrov, TG Dziura, SI Pandev… - US Patent …, 2018 - Google Patents
Methods and systems for estimating values of parameters of interest of actual device
structures based on optical measurements of nearby metrology targets are presented …
structures based on optical measurements of nearby metrology targets are presented …