[PDF][PDF] LPV modelling and predictive control of adjustable mirrors in an EUV lithography system
M Capat - research.tue.nl
In EUV lithography systems, the use of adjustable faceted mirrors ensures a uniform
intensity distribution and the optimal angular distribution of light at reticle level. Hundreds of …
intensity distribution and the optimal angular distribution of light at reticle level. Hundreds of …
[PDF][PDF] Identification of position-dependent mechanical systems
R de Rozario, RJ Voorhoeve, W Aangenent… - 35th Benelux Meeting …, 2016 - research.tue.nl
1 Background Increasing accuracy and speed demands in precision applications lead to a
situation where the flexible behavior of the system becomes relevant [1]. For instance, the …
situation where the flexible behavior of the system becomes relevant [1]. For instance, the …
[PDF][PDF] Model Order Selection for Robust-Control-Relevant Identification
P Tacx, R de Rozario, T Oomen - 2019 - research.tue.nl
Next-generation motion systems are envisioned to be lightweight due to increasing
demands regarding throughput and precision. As a result, flexible dynamic behaviour occurs …
demands regarding throughput and precision. As a result, flexible dynamic behaviour occurs …