Development and diagnostic study of the RF nitrogen atom source
M Li, X Xu, W Wu, S Peng, W Chen, Z Zhai, Q Luo… - Vacuum, 2025 - Elsevier
With the development of thin film technology, particularly the increasing demand for
research on group III nitride materials, the need for N ions has significantly increased. A …
research on group III nitride materials, the need for N ions has significantly increased. A …
Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD
Plasma enhanced atomic layer deposition (PEALD) is a cyclic atomic layer deposition (ALD)
process that incorporates plasma-generated species into one of the cycle substeps. The …
process that incorporates plasma-generated species into one of the cycle substeps. The …