Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining
Focused‐ion‐beam machining is a powerful process to fabricate complex nanostructures,
often through a sacrificial mask that enables milling beyond the resolution limit of the ion …
often through a sacrificial mask that enables milling beyond the resolution limit of the ion …
[HTML][HTML] Analysis of the electronic and chemical structure in boron and phosphorus passivated 4H-SiC/SiO2 interfaces using HRTEM and STEM-EELS
JA Taillon, CJ Klingshirn, C Jiao, Y Zheng… - Applied Physics …, 2018 - pubs.aip.org
We report a transmission electron microscopy (TEM) study of the impacts of phosphorus and
boron passivation processes at 4H-SiC/SiO 2 interfaces. The chemical and electronic …
boron passivation processes at 4H-SiC/SiO 2 interfaces. The chemical and electronic …