Line roughness in lamellae-forming block copolymer films
We study the line roughness in poly (styrene-b-methyl methacrylate) symmetric block
copolymer thin films and propose a phenomenological model to fit and describe the …
copolymer thin films and propose a phenomenological model to fit and describe the …
[PDF][PDF] High-χ Parameter Diblock Copolymers with Fluorinated Side Chains for Next Generation Lithography
L Dong - (No Title), 2020 - t2r2.star.titech.ac.jp
The ability to self-assemble into 1-100 nm scale regular patterns gives block copolymers
(BCPs) great potential in various industrial applications. Especially, perpendicularly-oriented …
(BCPs) great potential in various industrial applications. Especially, perpendicularly-oriented …