Two-dimensional devices and integration towards the silicon lines

S Wang, X Liu, M Xu, L Liu, D Yang, P Zhou - Nature materials, 2022 - nature.com
Despite technical efforts and upgrades, advances in complementary metal–oxide–
semiconductor circuits have become unsustainable in the face of inherent silicon limits. New …

The future of two-dimensional semiconductors beyond Moore's law

KS Kim, J Kwon, H Ryu, C Kim, H Kim, EK Lee… - Nature …, 2024 - nature.com
The primary challenge facing silicon-based electronics, crucial for modern technological
progress, is difficulty in dimensional scaling. This stems from a severe deterioration of …

Two-dimensional semiconductor integrated circuits operating at gigahertz frequencies

D Fan, W Li, H Qiu, Y Xu, S Gao, L Liu, T Li… - Nature …, 2023 - nature.com
Two-dimensional transition metal dichalcogenides could potentially be used to create
transistors that are scaled beyond the capabilities of silicon devices. However, despite …

[HTML][HTML] Wafer-scale high-κ dielectrics for two-dimensional circuits via van der Waals integration

Z Lu, Y Chen, W Dang, L Kong, Q Tao, L Ma… - Nature …, 2023 - nature.com
The practical application of two-dimensional (2D) semiconductors for high-performance
electronics requires the integration with large-scale and high-quality dielectrics—which …

Rhombohedral-stacked bilayer transition metal dichalcogenides for high-performance atomically thin CMOS devices

X Li, X Shi, D Marian, D Soriano, T Cusati… - Science …, 2023 - science.org
Van der Waals coupling with different stacking configurations is emerging as a powerful
method to tune the optical and electronic properties of atomically thin two-dimensional …

[HTML][HTML] Challenges for nanoscale CMOS logic based on two-dimensional materials

T Knobloch, S Selberherr, T Grasser - Nanomaterials, 2022 - mdpi.com
For ultra-scaled technology nodes at channel lengths below 12 nm, two-dimensional (2D)
materials are a potential replacement for silicon since even atomically thin 2D …

Atomic‐scale interface engineering for two‐dimensional materials based field‐effect transistors

X Hou, T Jin, Y Zheng, W Chen - SmartMat, 2023 - Wiley Online Library
Abstract Two‐dimensional (2D) materials with free of dangling bonds have the potential to
serve as ideal channel materials for the next generation of field‐effect transistors (FETs) due …

Dielectric material technologies for 2-D semiconductor transistor scaling

YC Lin, CM Lin, HY Chen, S Vaziri… - … on Electron Devices, 2022 - ieeexplore.ieee.org
The 2-D semiconductors have been recognized as promising channel materials for the
ultimately scaled transistor technologies beyond silicon. An essential technology enabler for …

From lab to fab: path forward for 2D material electronics

H Ning, Z Yu, T Li, H Shen, G Long, Y Shi… - Science China …, 2023 - Springer
The increasing demand for computation requires the development of energy-efficient logic
devices with reduced dimensions. Owing to their atomic thickness, 2D semiconductors are …

Ab Initio Computational Screening and Performance Assessment of van der Waals and Semimetallic Contacts to Monolayer WSe2 P-Type Field-Effect Transistors

N Yang, YC Lin, CP Chuu, MS Rahman… - … on Electron Devices, 2023 - ieeexplore.ieee.org
Recent technology development of logic devices based on 2-D semiconductors such as
MoS2, WS2, and WSe2 has triggered great excitement, paving the way to practical …