Abstract Micro‐concentrator photovoltaic (CPV), incorporating micro‐scale solar cells within
concentrator photovoltaic modules, promises an inexpensive and highly efficient technology …

In this paper, the impact of the plasma process for III-V/Ge heterostructure etching on both
the morphology and the photovoltaic performance is investigated for the fabrication of …

Abstract Series resistance is the key limiting factor that constrains the electrical performance
of solar cells under ultra‐high concentration. Typically, the most critical component of the …

A new proposal for the extraction of the shunt resistance (R sh) and saturation current (I sat)
of a current-voltage (I–V) measurement of a solar cell, within the one-diode model, is given …

Summary Three-dimensional (3D) interconnects increase chip power density and enable
miniaturization. Photonic chips require new processes to enable transitioning to 3D …

This article presents a complete plasma etching process to etch high aspect ratio patterns on
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …

InGaAs lattice matched to InP is a promising material for bottom sub-cell in a 4-junction solar
cell designed for concentrated photovoltaics applications. Here we compare the …

A core issue in concentrator photovoltaic technology (CPV) is the resistive losses in cells
that usually limits the maximum photoconversion efficiency under high concentration. We …

Les dispositifs photovoltaïques, dominés par les panneaux en silicium, ont su évoluer pour
proposer aujourd'hui des coûts d'électricité concurrentiels aux sources fossiles. Parmi les …

The laser micro-drilling of “thru” holes, also known as via holes, in Si, InP and InSb
semiconductor wafers was studied using millisecond pulse lengths from an IPG Laser Model …