Record-high hole mobility germanium on flexible plastic with controlled interfacial reaction

T Imajo, T Ishiyama, N Saitoh… - ACS Applied …, 2021 - ACS Publications
A semiconductor thin film with high carrier mobility was fabricated on a flexible film. During
the solid-phase crystallization process of the densified amorphous Ge layer, the interfacial …

Device structures and carrier transport properties of advanced CMOS using high mobility channels

S Takagi, T Tezuka, T Irisawa, S Nakaharai… - Solid-State …, 2007 - Elsevier
Mobility enhancement technologies have currently been recognized as mandatory for future
scaled MOSFETs. In this paper, the recent mobility enhancement technologies including …

High carrier mobility in orientation-controlled large-grain (≥ 50 μm) Ge directly formed on flexible plastic by nucleation-controlled gold-induced-crystallization

JH Park, K Kasahara, K Hamaya, M Miyao… - Applied Physics …, 2014 - pubs.aip.org
High-carrier-mobility semiconductors on flexible-plastic are essential to realize flexible
electronics. For this purpose, electrical properties of orientation-controlled large-grain Ge …

Polycrystalline thin-film transistors fabricated on high-mobility solid-phase-crystallized Ge on glass

K Moto, K Yamamoto, T Imajo, T Suemasu… - Applied physics …, 2019 - pubs.aip.org
Low-temperature formation of Ge thin-film transistors (TFTs) on insulators has been widely
investigated to improve the performance of Si large-scale integrated circuits and mobile …

Acceptor defects in polycrystalline Ge layers evaluated using linear regression analysis

T Imajo, T Ishiyama, K Nozawa, T Suemasu, K Toko - Scientific Reports, 2022 - nature.com
Polycrystalline Ge thin films have recently attracted renewed attention as a material for
various electronic and optical devices. However, the difficulty in the Fermi level control of …

High-quality single-crystal Ge stripes on quartz substrate by rapid-melting-growth

M Miyao, K Toko, T Tanaka, T Sadoh - Applied Physics Letters, 2009 - pubs.aip.org
Single-crystal Ge on a transparent insulating substrate is desired to achieve advanced thin-
film transistors (TFTs) with high speed operation. We have developed the rapid-melting …

Room temperature-grown highly oriented p-type nanocrystalline tellurium thin-films transistors for large-scale CMOS circuits

GH Kim, SH Kang, JM Lee, M Son, J Lee, H Lee… - Applied Surface …, 2023 - Elsevier
Although facile fabrication of high-performance thin-film transistor (TFT)-based
complementary metal oxide–semiconductor (CMOS) circuits over a large area has …

Advanced solid-phase crystallization for high-hole mobility (450 cm2 V− 1 s− 1) Ge thin film on insulator

R Yoshimine, K Moto, T Suemasu… - Applied physics …, 2018 - iopscience.iop.org
The hole mobility of the solid-phase-crystallized Ge layer is significantly improved by
controlling the deposition temperature of Ge (50–200 C) and the Ge thickness (50–500 nm) …

Structural and electrical properties of Ge (111) films grown on Si (111) substrates and application to Ge (111)-on-Insulator

K Sawano, Y Hoshi, S Kubo, K Arimoto, J Yamanaka… - Thin Solid Films, 2016 - Elsevier
Structural and electrical properties of a Ge (111) layer directly grown on a Si (111) substrate
are studied. Via optimized two-step growth manner, we form a high-quality relaxed Ge layer …

Chip-size formation of high-mobility Ge strips on SiN films by cooling rate controlled rapid-melting growth

K Toko, Y Ohta, T Tanaka, T Sadoh, M Miyao - Applied Physics Letters, 2011 - pubs.aip.org
High-quality Ge-on-insulators (GOIs) are essential structures for high-performance
transistors on an Si platform. We developed a rapid-melting-growth process for amorphous …