Au ion irradiation induces ultralow thermal conductivity in GaN

W Yan, Y Xue, W Zhou, Y Wang, H Guo, H Yang… - Applied Physics …, 2024 - pubs.aip.org
Gallium nitride (GaN) is widely considered as a crucial semiconductor for the nuclear
industry and space explorations due to its superior radiation hardness. Despite extensive …

Examining Different Regimes of Ionization‐Induced Damage in GaN Through Atomistic Simulations

MC Sequeira, F Djurabekova, K Nordlund, JG Mattei… - Small, 2022 - Wiley Online Library
The widespread adoption of gGaN in radiation‐hard semiconductor devices relies on a
comprehensive understanding of its response to strongly ionizing radiation. Despite being …

Failure mechanisms of AlGaN/GaN HEMTs irradiated by high-energy heavy ions with and without bias

PP Hu, LJ Xu, SX Zhang, PF Zhai, L Lv, XY Yan… - Nuclear Science and …, 2025 - Springer
Gallium nitride (GaN)-based devices have significant potential for space applications.
However, the mechanisms of radiation damage to the device, particularly from strong …

Microstructural changes in GaN and AlN under 950 MeV Au swift heavy ion irradiation

M Mahfuz, F Reza, X Liu, R Chu, M Lang… - Applied Physics …, 2024 - pubs.aip.org
The radiation hardness of GaN-based devices is a critical metric for applications in extreme
environments. This study investigates the structural changes in GaN and AlN induced by …

[HTML][HTML] Swift heavy ion irradiation puts InGaN/GaN multi-quantum wells on the track for efficient green light emission

M Sall, G Sow, A Baillard, A Dujarrier, L Goodwin… - Nano Trends, 2025 - Elsevier
Abstract InN and InGaN/GaN multi-quantum wells (MQWs) were subjected to Swift Heavy
Ion (SHI) irradiation. Ion track formation was studied using transmission electron microscopy …

Structural and mechanical modifications of GaN thin films by swift heavy ion irradiation

S Eve, A Ribet, JG Mattei, C Grygiel, E Hug, I Monnet - Vacuum, 2022 - Elsevier
The structural modifications and the evolution of mechanical behavior of gallium nitride
(GaN) thin films irradiated by 92 MeV 129 Xe 23+ at different fluences have been …

Microstructure Evolution in He-Implanted Si at 600° C Followed by 1000° C Annealing

Z Yang, Z Zou, Z Zhang, Y Xing, T Wang - Materials, 2021 - mdpi.com
Si single crystal was implanted with 230 keV He+ ions to a fluence of 5× 1016/cm2 at 600°
C. The structural defects in Si implanted with He at 600° C and then annealed at 1000° C …