Insulated gate and surface passivation structures for GaN-based power transistors

Z Yatabe, JT Asubar, T Hashizume - Journal of Physics D …, 2016 - iopscience.iop.org
Recent years have witnessed GaN-based devices delivering their promise of
unprecedented power and frequency levels and demonstrating their capability as an able …

Introduction of measurement techniques in ultrasonic electronics: Basic principles and recent trends

K Mizutani, N Wakatsuki, T Ebihara - Japanese Journal of …, 2016 - iopscience.iop.org
Measurement—the act of measuring physical properties that we perform—has the potential
to contribute to the successful advancement of sciences and society. To open doors in …

Wafer-scale transfer route for top–down III-nitride nanowire LED arrays based on the femtosecond laser lift-off technique

N Yulianto, AD Refino, A Syring, N Majid… - Microsystems & …, 2021 - nature.com
The integration of gallium nitride (GaN) nanowire light-emitting diodes (nanoLEDs) on
flexible substrates offers opportunities for applications beyond rigid solid-state lighting (eg …

Effects of a photo-assisted electrochemical etching process removing dry-etching damage in GaN

S Matsumoto, M Toguchi, K Takeda… - Japanese Journal of …, 2018 - iopscience.iop.org
We investigated the ability of a photo-assisted electrochemical (PEC) etching process to
remove the damage that dry etching causes in the near-surface region of GaN samples. The …

Mapping etching induced damages on GaN surfaces using scanning internal photoemission microscopy

A Terano, H Imadate, K Shiojima - Materials Science in Semiconductor …, 2017 - Elsevier
In this study, we used scanning internal photoemission microscopy (SIPM) to investigate
damage on the n-GaN surface, which were induced by inductive coupled plasma (ICP) …

Generation of electrical damage in n-GaN films following treatment in a CF4 plasma

Y Nakano, R Kawakami, M Niibe - Applied Physics Express, 2017 - iopscience.iop.org
We have investigated the generation of electrical damage in n-GaN films following treatment
in a CF 4 plasma, employing capacitance–voltage and steady-state photocapacitance …

Analysis of Deep Traps in Mist Chemical Vapor Deposition‐Grown n‐Type α‐Ga2O3 by Photocapacitance Method

H Takane, K Kaneko, T Shinohe… - physica status solidi (b …, 2021 - Wiley Online Library
Deep traps in n‐type α‐Ga2O3 grown by mist chemical vapor deposition are analyzed by
the photocapacitance method and deep‐level optical spectroscopy. The trap levels at …

AlGaN/GaN heterostructures with an AlGaN layer grown directly on reactive-ion-etched GaN showing a high electron mobility (> 1300 cm2 V− 1 s− 1)

A Yamamoto, S Makino, K Kanatani… - Japanese Journal of …, 2018 - iopscience.iop.org
In this study, the metal–organic-vapor-phase-epitaxial growth behavior and electrical
properties of AlGaN/GaN structures prepared by the growth of an AlGaN layer on a reactive …

Metalorganic vapor phase epitaxial growth of AlGaN directly on reactive-ion etching-treated GaN surfaces to prepare AlGaN/GaN heterostructures with high electron …

A Yamamoto, K Kanatani, S Makino… - Japanese Journal of …, 2018 - iopscience.iop.org
In this paper, we report the impact of the HCl treatment of reactive-ion-etching-treated GaN
(RIE-treated GaN) surfaces in fabricating AlGaN/GaN structures by regrowing an AlGaN …

Effect of post anode annealing on W/Au and Ni/Au multi-channel AlGaN/GaN Schottky diode

K Liu, C Wang, X Zheng, X Ma, Y He, A Li… - Superlattices and …, 2021 - Elsevier
In this paper, multi-channel AlGaN/GaN Schottky diodes (MC-SBDs) with W/Au and Ni/Au
anode metal were fabricated on the Si substrates, and the effect of post anode annealing …