Design and modification of interfaces, always a critical issue for semiconductor devices, has
become a primary tool to harness the full potential of halide perovskite (HaP)-based …

Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous
reactants and an exposed solid surface to deposit highly conformal coatings with a thickness …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

Abstract Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012
consisting of the individual perspectives of 16 leading experts in the various sub-fields of low …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

Atomic layer etching (ALE) is a technique for removing thin layers of material using
sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for …

Thin film is a modern technology aimed at improving the structural, electrical, magnetic,
optical, and mechanical properties of bulk materials. This technology has so far found …

Silicon wafer solar cells continue to be the leading photovoltaic technology, and in many
places are now providing a substantial portion of electricity generation. Further adoption of …

The reduction in electronic recombination losses by the passivation of silicon surfaces is a
critical enabler for high-efficiency solar cells. In 2006, aluminum oxide (Al 2 O 3) nanolayers …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …