SJ Jeong, JY Kim, BH Kim, HS Moon, SO Kim - Materials today, 2013 - Elsevier
Directed self-assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional …
JV Crivello, E Reichmanis - Chemistry of Materials, 2014 - ACS Publications
Photopolymers broadly comprise monomers, oligomers, polymers, or mixtures of the aforementioned materials that upon exposure to light undergo photochemical reactions that …
Semiconductor nanowires have been the subject of intensive research investment over the past few decades. Their physical properties afford them applications in a vast network of …
Bit-patterned media (BPM) for magnetic recording provides a route to thermally stable data recording at> 1 Tb/in 2 and circumvents many of the challenges associated with extending …
RMM Hasan, X Luo - Nanomanufacturing and Metrology, 2018 - Springer
Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods as the conventional photolithography comes with its intrinsic resolution limit. In this …
Lamellae-forming polystyrene-block-poly (methyl methacrylate)(PS-b-PMMA) films, with bulk period L 0, were directed to assemble on lithographically nanopatterned surfaces. The …
Figure 1. A) Mussel-inspired surface engineering of cherry tomato and Teflon film. Both the hydrophobic cherry tomato and the synthetic Teflon film surface could become dramatically …
Chemically patterned surfaces comprised of polymer mats and brushes of well-defined chemistry were fabricated at the length scale of 10 nm. A key concept is the integration of …
Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase …