Emerging electrochromic materials and devices for future displays

C Gu, AB Jia, YM Zhang, SXA Zhang - Chemical Reviews, 2022 - ACS Publications
With the rapid development of optoelectronic fields, electrochromic (EC) materials and
devices have received remarkable attention and have shown attractive potential for use in …

[HTML][HTML] Directed self-assembly of block copolymers for next generation nanolithography

SJ Jeong, JY Kim, BH Kim, HS Moon, SO Kim - Materials today, 2013 - Elsevier
Directed self-assembly of block copolymers has received a great deal of research attention
as a promising nanolithography to complement the intrinsic limitations of conventional …

Photopolymer materials and processes for advanced technologies

JV Crivello, E Reichmanis - Chemistry of Materials, 2014 - ACS Publications
Photopolymers broadly comprise monomers, oligomers, polymers, or mixtures of the
aforementioned materials that upon exposure to light undergo photochemical reactions that …

Semiconductor nanowire fabrication by bottom-up and top-down paradigms

RG Hobbs, N Petkov, JD Holmes - Chemistry of Materials, 2012 - ACS Publications
Semiconductor nanowires have been the subject of intensive research investment over the
past few decades. Their physical properties afford them applications in a vast network of …

Bit-patterned magnetic recording: Theory, media fabrication, and recording performance

TR Albrecht, H Arora… - IEEE Transactions …, 2015 - ieeexplore.ieee.org
Bit-patterned media (BPM) for magnetic recording provides a route to thermally stable data
recording at> 1 Tb/in 2 and circumvents many of the challenges associated with extending …

Promising lithography techniques for next-generation logic devices

RMM Hasan, X Luo - Nanomanufacturing and Metrology, 2018 - Springer
Continuous rapid shrinking of feature size made the authorities to seek alternative patterning
methods as the conventional photolithography comes with its intrinsic resolution limit. In this …

Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features

CC Liu, A Ramírez-Hernández, E Han… - …, 2013 - ACS Publications
Lamellae-forming polystyrene-block-poly (methyl methacrylate)(PS-b-PMMA) films, with bulk
period L 0, were directed to assemble on lithographically nanopatterned surfaces. The …

[PDF][PDF] Mussel‐inspired block copolymer lithography for low surface energy materials of teflon, graphene, and gold

BH Kim, DH Lee, JY Kim, DO Shin, HY Jeong… - Advanced …, 2011 - bonghoonkim.com
Figure 1. A) Mussel-inspired surface engineering of cherry tomato and Teflon film. Both the
hydrophobic cherry tomato and the synthetic Teflon film surface could become dramatically …

Fabrication of lithographically defined chemically patterned polymer brushes and mats

CC Liu, E Han, MS Onses, CJ Thode, S Ji… - …, 2011 - ACS Publications
Chemically patterned surfaces comprised of polymer mats and brushes of well-defined
chemistry were fabricated at the length scale of 10 nm. A key concept is the integration of …

Three‐dimensional nanofabrication by block copolymer self‐assembly

CA Ross, KK Berggren, JY Cheng, YS Jung… - Advanced …, 2014 - Wiley Online Library
Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of
semiconductor devices, membranes, and other structures, taking advantage of microphase …