With the development of microelectronics, the demand for continuously miniaturized feature
sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) …

Continuous ongoing development of dense integrated circuits requires significant
advancements in nanoscale patterning technology. As a key process in semiconductor high …

The unique electronic properties of semiconductor nanowires, in particular silicon nanowires
(SiNWs), are attractive for the label-free, real-time, and sensitive detection of various gases …

Flexible and stretchable electronics can dramatically enhance the application of electronics
for the emerging Internet of Everything applications where people, processes, data and …

The semiconductor industry has witnessed a continuous decrease in the size of logic,
memory and other computer chip components since its birth over half a century ago. The …

When certain polymers are heat-treated beyond their degradation temperature in the
absence of oxygen, they pass through a semi-solid phase, followed by the loss of …

Sub-10 nm patterning with extreme ultraviolet (EUV) light is receiving immediate attention as
a next-generation nanolithography technique, but photoresist materials optimized to EUV …

The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene
epoch, characterised by the ever-increasing human impact on the environment. The …

Although several years delayed than its initial plan, extreme UV lithography (EUVL) with
13.5 nm wavelength has been finally implemented into high volume manufacture (HVM) of …

In this study, a series of molecular resists based on a bis (4-butoxyphenyl) sulfone core
attached to a varying number of radiation-sensitive triphenylsulfonium units (BPSS n, where …