Triple-stack ZnO/AlZnO/YZnO heterojunction oxide thin-film transistors by spray pyrolysis for high mobility and excellent stability

JK Saha, MM Billah, J Jang - ACS applied materials & interfaces, 2021 - ACS Publications
We demonstrate a high mobility, triple-stack ZnO/AlZnO/YZnO heterojunction thin-film
transistor (TFT) using the semiconductors deposited by spray pyrolysis at 350° C on an …

Microstructure, dielectric and optical properties of transparent flexible high-k Bi1. 5MgNb1. 5O7 thin films

W Peng, L Wang, G Qi, B Nie, J Ge, R Wei, T Xu… - Ceramics …, 2024 - Elsevier
High-k insulation materials can effectively reduce the operating voltage and leakage current
of TFT devices, improving device performance owing to their high dielectric constant and …

Metal oxide ion gated transistors based sensors

Y Li, Y Yao, LL Wang, LW Wang, YC Pang… - Science China …, 2024 - Springer
Metal oxide ion-gated transistors (MOIGTs) have garnered significant attention within the
sensing domain due to their potential for achieving heightened sensitivity while consuming …

Numerical analysis of oxygen-related defects in amorphous In-WO nanosheet thin-film transistor

WT Fan, PT Liu, PY Kuo, CM Chang, IH Liu, Y Kuo - Nanomaterials, 2021 - mdpi.com
The integration of 4 nm thick amorphous indium tungsten oxide (a-IWO) and a hafnium oxide
(HfO2) high-κ gate dielectric has been demonstrated previously as one of promising …

All solution-processed hafnium rich hybrid dielectrics for hysteresis free metal-oxide thin-film transistors

JM Arroyo, MGS Rao, MS de Urquijo Ventura… - Journal of Materials …, 2023 - pubs.rsc.org
Organic–inorganic (O–I) hybrid materials combine the great variability and interactions at the
molecular scale that have been demonstrated to have an impact on their properties …

Understanding the Origin of the Hysteresis of High-Performance Solution Processed Polycrystalline SnO2 Thin-Film Transistors and Applications to Circuits

C Avis, J Jang - Membranes, 2021 - mdpi.com
Crystalline tin oxide has been investigated for industrial applications since the 1970s.
Recently, the amorphous phase of tin oxide has been used in thin film transistors (TFTs) and …

High‐Performance Full‐Solution‐Processed Oxide Thin‐Film Transistor Arrays Fabricated by Ultrafast Scanning Diode Laser

M Xu, S Hu, C Peng, B Jing, L Chen… - Advanced Materials …, 2022 - Wiley Online Library
The full‐solution‐processed oxide thin‐film transistor (TFT) array is successfully realized by
using ultrafast scanning diode laser annealing (USDLA). It integrates all solution‐processed …

Dual Role of AgNO3 as an Oxidizer and Chloride Remover toward Enhanced Combustion Synthesis of Low-Voltage and Low-Temperature Amorphous Rare Metal …

CGP Quino, JP Bermundo, H Kawanishi… - ACS Applied …, 2024 - ACS Publications
SnO2 transistors show great promise as an alternative to existing In2O3-based transistors,
considering their abundance and similar electronic properties. However, they suffer from …

Combining Aqueous Solution Processing and Printing for Fabrication of Flexible and Sustainable Tin Dioxide Ion‐Gated Transistors

A Subramanian, M Azimi, C Santato… - Advanced Materials …, 2022 - Wiley Online Library
Ion‐gated transistors (IGTs) are extensively used in chemo‐and bio‐sensors as well as
intelligent sensors, that is, with neuromorphic computing functionality, exploiting their ion to …

Influence of NF3 Plasma-Treated HfO2 Gate Insulator Surface on Tin Oxide Thin-Film Transistors

C Avis, J Jang - Materials, 2023 - mdpi.com
We studied the impact of NF3 plasma treatment on the HfO2 gate insulator of amorphous tin
oxide (a-SnOx) thin-film transistors (TFTs). The plasma treatment was for 0, 10, or 30 s. The …