Application of patterned sapphire substrate for III-nitride light-emitting diodes

S Zhou, X Zhao, P Du, Z Zhang, X Liu, S Liu, LJ Guo - Nanoscale, 2022 - pubs.rsc.org
Recent decades have witnessed flourishing prosperity of III-nitride emitters in solid-state
lighting and high-resolution displays. As one of the widely used substrates, sapphire shows …

Review of technology for normally-off HEMTs with p-GaN gate

G Greco, F Iucolano, F Roccaforte - Materials Science in Semiconductor …, 2018 - Elsevier
Owing to the high carrier density and high electron mobility of the two dimensional electron
gas (2DEG), high electron mobility transistors (HEMTs) based on gallium nitride (GaN) are …

GaN-based light-emitting diodes on various substrates: a critical review

G Li, W Wang, W Yang, Y Lin, H Wang… - Reports on Progress …, 2016 - iopscience.iop.org
GaN and related III-nitrides have attracted considerable attention as promising materials for
application in optoelectronic devices, in particular, light-emitting diodes (LEDs). At present …

Growth and applications of group III-nitrides

O Ambacher - Journal of physics D: Applied physics, 1998 - iopscience.iop.org
Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the
different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures …

GaN: Processing, defects, and devices

SJ Pearton, JC Zolper, RJ Shul, F Ren - Journal of applied physics, 1999 - pubs.aip.org
The role of extended and point defects, and key impurities such as C, O, and H, on the
electrical and optical properties of GaN is reviewed. Recent progress in the development of …

Prospects of III-nitride optoelectronics grown on Si

D Zhu, DJ Wallis, CJ Humphreys - Reports on Progress in …, 2013 - iopscience.iop.org
The use of III-nitride-based light-emitting diodes (LEDs) is now widespread in applications
such as indicator lamps, display panels, backlighting for liquid-crystal display TVs and …

[PDF][PDF] Thick GaN epitaxial growth with low dislocation density by hydride vapor phase epitaxy

A Usui, H Sunakawa, A Sakai… - … JOURNAL OF APPLIED …, 1997 - researchgate.net
1. Introduction Recently, blue-or ultraviolet-light-emitting lasers have been developed using
GaN and InGaN-based compound semiconductors.*** These device structures have been …

InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate

S Nakamura, M Senoh, S Nagahama, N Iwasa… - Applied Physics …, 1998 - pubs.aip.org
InGaN multi-quantum-well-structure laser diodes with Al0. 14Ga0. 86N/GaN modulation
doped strained-layer superlattice cladding layers grown on an epitaxially laterally …

Group III nitride and SiC based MEMS and NEMS: materials properties, technology and applications

V Cimalla, J Pezoldt, O Ambacher - Journal of Physics D: Applied …, 2007 - iopscience.iop.org
With the increasing requirements for microelectromechanical systems (MEMS) regarding
stability, miniaturization and integration, novel materials such as wide band gap …

Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO)

K Hiramatsu, K Nishiyama, M Onishi, H Mizutani… - Journal of Crystal …, 2000 - Elsevier
Facet structures of GaN grown by epitaxial lateral overgrowth (ELO) via low-pressure
metalorganic vapor-phase epitaxy (LP-MOVPE) are controlled by growth conditions such as …