Ferroelectric field effect transistors (FeFETs): advancements, challenges and exciting prospects for next generation non-volatile memory (NVM) applications

J Ajayan, P Mohankumar, D Nirmal… - Materials Today …, 2023 - Elsevier
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things)
demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …

Ferroelectricity of hafnium oxide-based materials: Current status and future prospects from physical mechanisms to device applications

W Yang, C Yu, H Li, M Fan, X Song, H Ma… - Journal of …, 2023 - iopscience.iop.org
The finding of the robust ferroelectricity in HfO 2-based thin films is fantastic from the view
point of both the fundamentals and the applications. In this review article, the current …

Fast read-after-write and depolarization fields in high endurance n-type ferroelectric FETs

M Hoffmann, AJ Tan, N Shanker… - IEEE Electron …, 2022 - ieeexplore.ieee.org
Ferroelectric field-effect transistors (FeFETs) based on HfO 2 are promising for low-power
and high-speed non-volatile memory devices. However, most reported FeFETs show limited …

Enhanced Ferroelectricity in Hf‐Based Ferroelectric Device with ZrO2 Regulating Layer

Y Liu, T Wang, Z Li, J Yu, J Meng, K Xu… - Advanced Electronic …, 2023 - Wiley Online Library
HfAlO film‐based ferroelectric memory is a strong contender for the next‐generation
nonvolatile memories. However, the remanent polarization intensity of HfAlO films is small …

High performance ferroelectric field-effect transistors for large memory-window, high-reliability, high-speed 3D vertical NAND flash memory

G Kim, S Lee, T Eom, T Kim, M Jung, H Shin… - Journal of Materials …, 2022 - pubs.rsc.org
A ferroelectric field-effect transistor (FeFET) has significant potential as a leading contender
to replace current NAND flash memory owing to its high operation speed, low power …

Ferroelectric HfO2-based synaptic devices: recent trends and prospects

S Yu, J Hur, YC Luo, W Shim, G Choe… - Semiconductor Science …, 2021 - iopscience.iop.org
Neuro-inspired deep learning algorithms have shown promising futures in artificial
intelligence. Despite the remarkable progress in software-based neural networks, the …

First direct observation of the built-in electric field and oxygen vacancy migration in ferroelectric Hf 0.5 Zr 0.5 O 2 film during electrical cycling

L Chen, Z Liang, S Shao, Q Huang, K Tang, R Huang - Nanoscale, 2023 - pubs.rsc.org
The wake-up and fatigue effects exhibited by ferroelectric hafnium oxide (HfO2) during
electrical cycling are two of the most significant obstacles limiting its development and …

Improved reliability for back-end-of-line compatible ferroelectric capacitor with 3 bits/cell storage capability by interface engineering and post deposition annealing

HK Peng, TC Lai, YC Kao, CM Liu… - IEEE Electron Device …, 2022 - ieeexplore.ieee.org
AlON/HfZrOx (HZO)/HfO2 stack with post-deposition annealing (PDA) process at 400° C is
proposed to implement BEOL compatible ferroelectric (FE) capacitors. While interface …

Low-power and high-speed HfLaO-based FE-TFTs for artificial synapse and reconfigurable logic applications

Y Liu, T Wang, K Xu, Z Li, J Yu, J Meng, H Zhu… - Materials …, 2024 - pubs.rsc.org
Emulating the human nervous system to build next-generation computing architectures is
considered a promising way to solve the von Neumann bottleneck. Transistors based on …

Disturb-free operations of multilevel cell ferroelectric FETs for NAND applications

C Jin, J Xu, J Gu, J Zhao, X Jia, J Chen… - … on Electron Devices, 2023 - ieeexplore.ieee.org
We have experimentally investigated disturb-free operations of multilevel cell (MLC)
ferroelectric field-effect transistors (FeFETs) in a NAND array. The fabricated FeFET cells are …