The application of porous silicon as a template for the fabrication of nanosized copper objects is reported. Three different types of nanostructures were formed by displacement …
H Bandarenka, V Petrovich, O Komar, P Nenzi… - ECS …, 2012 - iopscience.iop.org
Different copper nanostructures have been deposited onto porous silicon (PS) by using HF- based solutions of CuSO4 and immersion technique. The variation of the porous template …
UM Nayef - Engineering and Technology Journal, 2017 - iasj.net
In this paper, porous silicon was prepared by using electrochemical etching technique of p- type silicon acceptor, with a resistivity of 1.5-4Ohm. cm, using hydrochloric acid with …
H Bandarenka - META'12, 2012 - metaconferences.org
Displacement technique was applied to form silver and copper deposits. Using porous silicon as a substrate gave a metal film nanoroughness. Morphology of the obtained …