Gallium nitride as an electromechanical material

M Rais-Zadeh, VJ Gokhale, A Ansari… - Journal of …, 2014 - ieeexplore.ieee.org
Gallium nitride (GaN) is a wide bandgap semiconductor material and is the most popular
material after silicon in the semiconductor industry. The prime movers behind this trend are …

Power Electronic Semiconductor Materials for Automotive and Energy Saving Applications – SiC, GaN, Ga2O3, and Diamond

PJ Wellmann - Zeitschrift für anorganische und allgemeine …, 2017 - Wiley Online Library
Power electronics belongs to the future key technologies in order to increase system
efficiency as well as performance in automotive and energy saving applications. Silicon is …

[图书][B] The blue laser diode: GaN based light emitters and lasers

S Nakamura, G Fasol - 2013 - books.google.com
Shuji Nakamura's development of commercial light emitters from Gallium Nitride and related
materials has recently propelled these materials into the mainstream of interest. It is very …

The blue laser diode. The complete story

S Nakamura, S Pearton, G Fasol - Measurement Science and …, 2001 - iopscience.iop.org
The story of Shuji Nakamura and the blue laser diode is remarkable. It is clear from this book
that he enjoys this fact and wishes his readers to become familiar with his success …

GaN-based optoelectronics on silicon substrates

A Krost, A Dadgar - Materials Science and Engineering: B, 2002 - Elsevier
Cracking of GaN on Si usually occurs due to the large thermal mismatch of GaN and Si
when layer thicknesses exceed approximately 1 μm in metalorganic chemical vapor …

Metalorganic chemical vapor phase epitaxy of crack-free GaN on Si (111) exceeding 1 µm in thickness

A Dadgar, J Bläsing, A Diez, A Alam… - Japanese Journal of …, 2000 - iopscience.iop.org
We present a simple method for the elimination of cracks in GaN layers grown on Si (111).
Cracking of GaN on Si usually occurs due to large lattice and thermal mismatch of GaN and …

The effect of the III/V ratio and substrate temperature on the morphology and properties of GaN-and AlN-layers grown by molecular beam epitaxy on Si (1 1 1)

MA Sanchez-Garcia, E Calleja, E Monroy… - Journal of crystal …, 1998 - Elsevier
We have studied the effect of the III/V ratio and substrate temperature on the growth of GaN
and A1N films on Si (1 1 1) substrates by molecular beam epitaxy, where active nitrogen …

Growth of group III nitrides. A review of precursors and techniques

DA Neumayer, JG Ekerdt - Chemistry of materials, 1996 - ACS Publications
The AlGaInN quaternary alloy system is uniquely suited for numerous device applications
because the bandgap can be varied from 1.9 to 6.2 eV by changing the alloy composition …

Thermal stability of GaN on (1 1 1) Si substrate

H Ishikawa, K Yamamoto, T Egawa, T Soga… - Journal of crystal …, 1998 - Elsevier
We studied thermal annealing effects of low-temperature-grown GaN (LT-GaN) on Si
substrate by use of the two step growth technique. Difficulties were encountered when LT …

Metalorganic chemical vapor deposition of GaN on Si (111): Stress control and application to field-effect transistors

H Marchand, L Zhao, N Zhang, B Moran… - Journal of Applied …, 2001 - pubs.aip.org
Two schemes of nucleation and growth of gallium nitride on Si (111) substrates are
investigated and the structural and electrical properties of the resulting films are reported …