High-performance SRAM in nanoscale CMOS: Design challenges and techniques

CT Chuang, S Mukhopadhyay, JJ Kim… - … , design and testing, 2007 - ieeexplore.ieee.org
This paper reviews the design challenges and techniques of high-performance SRAM in the
“End of Scaling” nanoscale CMOS technologies. The impacts of technology scaling, such as …

Single-ended subthreshold SRAM with asymmetrical write/read-assist

MH Tu, JY Lin, MC Tsai, SJ Jou… - IEEE Transactions on …, 2010 - ieeexplore.ieee.org
In this paper, asymmetrical Write-assist cell virtual ground biasing scheme and positive
feedback sensing keeper schemes are proposed to improve the read static noise margin …

Nanometer MOSFET variation in minimum energy subthreshold circuits

N Verma, J Kwong… - IEEE Transactions on …, 2007 - ieeexplore.ieee.org
Minimum energy operation for digital circuits typically requires scaling the power supply
below the device threshold voltage. Advanced technologies offer improved integration …

Variation in transistor performance and leakage in nanometer-scale technologies

S Saxena, C Hess, H Karbasi, A Rossoni… - … on Electron Devices, 2007 - ieeexplore.ieee.org
Variation in transistor characteristics is increasing as CMOS transistors are scaled to
nanometer feature sizes. This increase in transistor variability poses a serious challenge to …

A process-variation-tolerant dual-power-supply SRAM with 0.179µm2 Cell in 40nm CMOS using level-programmable wordline driver

O Hirabayashi, A Kawasumi, A Suzuki… - … Solid-State Circuits …, 2009 - ieeexplore.ieee.org
A 512Kb dual-power-supply SRAM is fabricated in 40nm CMOS with 0.179 µm 2 cell, which
is 10% smaller than the SRAM scaling trend. The smaller cell size is realized by channel …

A discussion on SRAM circuit design trend in deeper nanometer-scale technologies

H Yamauchi - IEEE Transactions on Very Large Scale …, 2009 - ieeexplore.ieee.org
This paper compares area scaling capabilities of many kinds of SRAM margin-assist
solutions for VT variability issues, which are based on various efforts by not only the cell …

Approximate SRAMs with dynamic energy-quality management

F Frustaci, D Blaauw, D Sylvester… - IEEE Transactions on …, 2016 - ieeexplore.ieee.org
In this paper, approximate SRAMs are explored in the context of error-tolerant applications,
in which energy is saved at the cost of the occurrence of read/write errors (ie, signal quality …

Synchronous ultra-high-density 2RW dual-port 8T-SRAM with circumvention of simultaneous common-row-access

K Nii, Y Tsukamoto, M Yabuuchi… - IEEE Journal of Solid …, 2009 - ieeexplore.ieee.org
We propose an access scheme for a synchronous dual-port (DP) SRAM that minimizes the
8T-DP-cell area and maintains cell stability. A priority row decoder circuit and shifted bit-line …

A 45-nm bulk CMOS embedded SRAM with improved immunity against process and temperature variations

K Nii, M Yabuuchi, Y Tsukamoto… - IEEE Journal of Solid …, 2008 - ieeexplore.ieee.org
The variation tolerant assist circuits of an SRAM against process and temperature are
proposed. Passive resistances are introduced to the read assist circuit with replica memory …

Adaptive circuits for the 0.5-V nanoscale CMOS era

K Itoh, M Yamaoka, T Oshima - IEICE transactions on electronics, 2010 - search.ieice.org
The minimum operating voltage, V min, of nanoscale CMOS LSIs is investigated to breach
the 1-V wall that we are facing in the 65-nm device generation, and open the door to the …