Engineering of dense arrays of Vertical Si1-x Ge x nanostructures

J Müller, A Lecestre, R Demoulin, F Cristiano… - …, 2022 - iopscience.iop.org
Vertical nanostructure technologies are becoming more important for the down scaling of
nanoelectronic devices such as logic transistors or memories. Such devices require dense …

SiGe superlattice nanocrystal pure and doped with substitutional phosphorus single atom: Density functional theory study

MA Abdulsattar - Superlattices and Microstructures, 2011 - Elsevier
Ab initio density functional theory is used to simulate electronic structure of hydrogenated
SiGe nanocrystal superlattice pure and doped with substitutional P single atom. The results …

Oxidation of Germanium and Silicon surfaces (100): a comparative study through DFT methodology

C Mastail, I Bourennane, A Estève… - IOP Conference …, 2012 - iopscience.iop.org
Abstract Density Functional Theory calculations are used to map out the preferential oxygen
molecule adsorption sites and oxygen atom incorporation on germanium (100) surface. A …

Influence of Ge content and annealing conditions on the PL properties of nc-Si1− xGex embedded in SiO2 matrix in weak quantum confined regime

E Tuğay, S Ilday, R Turan, TG Finstad - Journal of luminescence, 2014 - Elsevier
Abstract Fabrication of Si (nc-Si), Ge (nc-Ge), and Si 1− x Ge x (nc-Si 1− x Ge x) nanocrystals
embedded in SiO 2 matrix is achieved by thermal annealing of magnetron-sputtered thin …

WET and Siconi® cleaning sequences for SiGe epitaxial regrowth

PE Raynal, V Loup, L Vallier, N Bernier… - Materials Science and …, 2020 - Elsevier
SiGe channels can be used to boost the hole mobility and tailor the threshold voltage shift in
advanced p-type Metal Oxide Semiconductor Field Effect Transistors. An efficient removal of …

Stability of Frenkel pairs in Si (1 0 0) surface in the presence of germanium and oxygen atoms

S Fetah, A Chikouche, A Dkhissi, G Landa… - Microelectronic …, 2011 - Elsevier
A first-principles pseudo-potential study of Frenkel pair generation close to the Si (100)
surface in the presence of germanium and oxygen atoms is reported. The energies and …

Suppression of boron segregation by interface Ge atoms at SiGe/SiO2 interface

CH Lee, GM Kim, YJ Oh, KJ Chang - Current Applied Physics, 2014 - Elsevier
We investigate the migration pathway and barrier for B diffusion at SiGe/SiO 2 interface
through first-principles density functional calculations. Similar to the diffusion mechanism …

Synchrotron radiation photoelectron spectroscopy study on oxides formed at Ge (100) 2× 1 surface in atmosphere

A Yoshigoe - Japanese Journal of Applied Physics, 2020 - iopscience.iop.org
Synchrotron radiation photoelectron spectroscopy was applied to conduct chemical analysis
of Ge oxides formed at the Ge (100) 2× 1 surface in atmosphere at room temperature. High …

[PDF][PDF] WET and Siconi® cleaning sequences for SiGe epitaxial regrowth PE Raynala, b, V. Loupa, L. Vallierb, N. Berniera, JM Hartmanna, P. Bessonc a-Univ …

PE Raynala - 2020 - hal.science
SiGe channels can be used to boost the hole mobility and tailor the threshold voltage shift in
advanced p-type Metal Oxide Semiconductor Field Effect Transistors. An efficient removal of …

Modélisation simulation multi-échelle de la croissance de nanoplôts de Si sur des substrats Si et SiGe oxydés

S Fetah - 2018 - dspace.univ-setif.dz
Introduction générale Page 1 Page 2 Page 3 Sommaire Introduction générale .............................................................................................................
1 Chapitre 1 : Mémoires non volatiles à nanoplôts ................................................................ 5 1 …