Growth and applications of GeSn-related group-IV semiconductor materials

S Zaima, O Nakatsuka, N Taoka… - … and technology of …, 2015 - iopscience.iop.org
We review the technology of Ge 1− x Sn x-related group-IV semiconductor materials for
developing Si-based nanoelectronics. Ge 1− x Sn x-related materials provide novel …

High-electrical-conductivity multilayer graphene formed by layer exchange with controlled thickness and interlayer

H Murata, Y Nakajima, N Saitoh, N Yoshizawa… - Scientific reports, 2019 - nature.com
The layer exchange technique enables high-quality multilayer graphene (MLG) on arbitrary
substrates, which is a key to combining advanced electronic devices with carbon materials …

Metal-induced layer exchange of group IV materials

K Toko, T Suemasu - Journal of Physics D: Applied Physics, 2020 - iopscience.iop.org
Layer exchange (LE) is an interesting phenomenon in which metal and semiconductor
layers exchange during heat treatment. A great deal of effort has been put into research on …

Record-high hole mobility germanium on flexible plastic with controlled interfacial reaction

T Imajo, T Ishiyama, N Saitoh… - ACS Applied …, 2021 - ACS Publications
A semiconductor thin film with high carrier mobility was fabricated on a flexible film. During
the solid-phase crystallization process of the densified amorphous Ge layer, the interfacial …

High-hole mobility polycrystalline Ge on an insulator formed by controlling precursor atomic density for solid-phase crystallization

K Toko, R Yoshimine, K Moto, T Suemasu - Scientific reports, 2017 - nature.com
High-carrier mobility semiconductors on insulators are essential for fabricating advanced
thin-film transistors, allowing for three-dimensional integrated circuits or high-performance …

Perspectives on metal induced crystallization of a-Si and a-Ge thin films

G Maity, S Dubey, T Meher, S Dhar, D Kanjilal, T Som… - RSC …, 2022 - pubs.rsc.org
In recent times, the metal induced crystallization (MIC) process in amorphous
semiconductors (a-Si and a-Ge) has been extensively investigated by many researchers …

High hole mobility tin-doped polycrystalline germanium layers formed on insulating substrates by low-temperature solid-phase crystallization

W Takeuchi, N Taoka, M Kurosawa… - Applied Physics …, 2015 - pubs.aip.org
We investigated the effects of incorporation of 0%–2% tin (Sn) into amorphous germanium
(Ge) on its crystallization behavior and electrical properties. Incorporation of only 0.2% Sn …

High-electron mobility P-doped polycrystalline GeSn layers formed on insulators at low temperatures

K Nozawa, T Ishiyama, T Nishida, N Saitoh… - Applied Physics …, 2023 - pubs.aip.org
Despite its long history, synthesizing n-type polycrystalline Ge layers with high-electron
mobility on insulating substrates has been difficult. Based on our recently developed solid …

High hole mobility (≥ 500 cm2 V− 1 s− 1) polycrystalline Ge films on GeO2-coated glass and plastic substrates

T Imajo, K Moto, R Yoshimine, T Suemasu… - Applied physics …, 2018 - iopscience.iop.org
The highest recorded hole mobility in semiconductor films on insulators has been updated
significantly. We investigate the solid-phase crystallization of a densified amorphous Ge …

Thermoelectric inorganic SiGe film synthesized on flexible plastic substrate

K Kusano, A Yamamoto, M Nakata… - ACS Applied Energy …, 2018 - ACS Publications
For developing thermoelectric thin-film devices using reliable inorganic materials, we
investigated the synthesis of SiGe directly onto insulating substrates. An Al-induced layer …