Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma

YA Lebedev - Plasma Sources Science and Technology, 2015 - iopscience.iop.org
Microwave discharges (MD) are widely used as a source of non-equilibrium low pressure
plasma for different applications. This paper reviews the methods of microwave plasma …

Current synthetic methodologies of carbon nanotubes: a review

S Sharma - Mini-Reviews in Organic Chemistry, 2023 - benthamdirect.com
Carbon Nanotubes (CNTs) possess a unique one-dimensional molecular geometry with a
large surface area. Recently, CNTs have become a thrust area of research as they play a …

Explore the growth mechanism of high-quality diamond under high average power density in the MPCVD reactor

Z Yang, K An, X Feng, Y Liu, Z Guo, J Wei… - Materials Science and …, 2024 - Elsevier
Investigating the mechanism behind the high-efficiency deposition of high-quality diamond
has always been a prominent topic in related research. This paper investigates the CH 4-H 2 …

Non-heat assistance plasma-enhanced chemical vapor deposition of SiCxNyOz film using monomethylsilane, nitrogen and argon

MH Minh, T Watanabe, K Shioda… - ECS Journal of Solid …, 2017 - iopscience.iop.org
Without any heating assistance, a gas mixture of monomethylsilane, nitrogen and argon was
used at 10–20 Pa for 5 min for forming a SiC x N y O z film under parallel plate plasma. By …

Role of Oxygen in PECVD Carbon Nanotubes Growth: Experiments and Modeling

A Andalouci, I Hinkov, O Brinza, A Kane… - Plasma Chemistry and …, 2023 - Springer
We investigate by modeling supported by experiments the role of oxygen in carbon
nanotubes (CNT) growth by plasma enhanced chemical vapor deposition (PECVD) process …

Multimolecular interactions for SiCxNyOz film formation by parallel plate plasma-enhanced chemical vapor deposition without heat assistance

H Kawakami, K Hori, T Watanabe, H Habuka - Materials Chemistry and …, 2023 - Elsevier
In order to study the multimolecular interactions for the SiC x N y O z film formation by the
parallel plate plasma-enhanced chemical vapor deposition without heat assistance, the …

Electric current in rate equation for parallel plate plasma-enhanced chemical vapour deposition of SiCxNyOz film without heat assistance

K Hori, T Watanabe, H Habuka - ECS Journal of Solid State …, 2020 - iopscience.iop.org
Abstract A 50–500 nm-thick SiC x N y O z film was formed in parallel plate plasma at room
temperature using a gas mixture of monomethylsilane, nitrogen and argon at 10− 30 Pa for 5 …

Synthesis of nanostructure diamond-like carbon thin films by atmospheric pressure plasma jet

HR Humud, SJ Kadhem, AA Abbass - AIP Conference Proceedings, 2020 - pubs.aip.org
In this wor#, diamond-li# e carbon (DLC) thin films were prepared from Cyclohexane. Thin
films were deposited on quartz substrate by atmospheric pressure Argon plasma jet system …

SIMULASI PELAPISAN DIAMOND-LIKE CARBON (DLC) MELALUI COMPUTATIONAL FLUID DYNAMICS ANSYS FLUENT DENGAN MENGAMATI PENGARUH …

R Firman - 2024 - eprints.untirta.ac.id
Diamond-like carbon (DLC) merupakan material karbon yang dapat dideposisikan sebagai
bahan pelapis pada substrat logam. Deposisi material DLC ini dapat dilakukan pada proses …

Rozkład temperatury w reaktorze plazmy mikrofalowej: pomiary i modelowanie

M Wnukowski - Zeszyty Energetyczne, 2015 - yadda.icm.edu.pl
Niniejsza praca dotyczy modelowania maj acego na celu wyznaczenie temperatur panuj
acych w reaktorze plazmy mikrofalowej. W symulacjach tych wykorzystano dwie metody …