Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Background A plausible approach for mitigating the mask 3-D (M3D) effects observed in
extreme ultraviolet (EUV) lithography is to replace the existing mask absorber with …
extreme ultraviolet (EUV) lithography is to replace the existing mask absorber with …
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
SD Halle, L Meli, R Delancey… - Extreme Ultraviolet …, 2015 - spiedigitallibrary.org
The detection of EUV mask adder defects has been investigated with an optical wafer defect
inspection system employing a methodology termed Die-to-“golden” Virtual Reference Die …
inspection system employing a methodology termed Die-to-“golden” Virtual Reference Die …
Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
V Soltwisch, P Naujok, C Detavernier, D Dattilo… - 2023 - spiedigitallibrary.org
Background: A plausible approach for mitigating the mask 3-D (M3D) effects observed in
extreme ultraviolet (EUV) lithography is to replace the existing mask absorber with …
extreme ultraviolet (EUV) lithography is to replace the existing mask absorber with …
Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers
The ability to rapidly detect both printable EUV mask adder defects as well as mask
absorber defects across the entire mask image field is a key enabler for EUV lithography …
absorber defects across the entire mask image field is a key enabler for EUV lithography …
AFM nanomachining and clean repair of EUV TaBN advanced absorber material
MJ Cadena, T Robinson - Photomask Technology 2023, 2023 - spiedigitallibrary.org
In prior work, the capability of novel nanomachining processes to repair TaN EUV absorber
materials was shown using 1.8 aspect ratio (AR) AFM tips in line and space patterns down to …
materials was shown using 1.8 aspect ratio (AR) AFM tips in line and space patterns down to …
Exploring EUV mask backside defectivity and control methods
C Turley, J Rankin, L Kindt, M Lawliss… - Photomask Japan …, 2015 - spiedigitallibrary.org
The backside of photomasks have been largely ignored during the last several decades of
development, with the exception of avoiding gross damage or defects, as almost all …
development, with the exception of avoiding gross damage or defects, as almost all …