Physical and chemical mechanisms in oxide-based resistance random access memory

KC Chang, TC Chang, TM Tsai, R Zhang… - Nanoscale research …, 2015 - Springer
In this review, we provide an overview of our work in resistive switching mechanisms on
oxide-based resistance random access memory (RRAM) devices. Based on the …

Atomic-level quantized reaction of HfOx memristor

YE Syu, TC Chang, JH Lou, TM Tsai, KC Chang… - Applied Physics …, 2013 - pubs.aip.org
In this study, we have observed dynamic switching behaviors in a memristive device. There
are only a few atoms in the resistive switching reaction which enables the high-speed …

Charge quantity influence on resistance switching characteristic during forming process

TJ Chu, TC Chang, TM Tsai, HH Wu… - IEEE Electron …, 2013 - ieeexplore.ieee.org
In this letter, we presented that the charge quantity is the critical factor for forming process.
Forming is a pivotal process in resistance random access memory to activate the resistance …

[HTML][HTML] Low-power resistive random access memory by confining the formation of conducting filaments

YJ Huang, TH Shen, LH Lee, CY Wen, SC Lee - AIP Advances, 2016 - pubs.aip.org
Owing to their small physical size and low power consumption, resistive random access
memory (RRAM) devices are potential for future memory and logic applications in …

Silicon introduced effect on resistive switching characteristics of WOX thin films

YE Syu, TC Chang, TM Tsai, GW Chang… - Applied Physics …, 2012 - pubs.aip.org
The switching layer with Si interfusion is investigated to improve the electrical characteristics
of WO X resistance random access memory (RRAM). The WO X has attracted extensive …

Asymmetric Carrier Conduction Mechanism by Tip Electric Field in Resistance Switching Device

YE Syu, TC Chang, TM Tsai, GW Chang… - IEEE electron device …, 2012 - ieeexplore.ieee.org
Resistance random access memory (RRAM) is a great potential candidate for next-
generation nonvolatile memory due to the outstanding memory characteristic. However, the …

Hopping conduction distance dependent activation energy characteristics of Zn: SiO2 resistance random access memory devices

KH Chen, R Zhang, TC Chang, TM Tsai… - Applied Physics …, 2013 - pubs.aip.org
In this study, the hopping conduction distance variation of Zn: SiO 2 resistance random
access memory (RRAM) devices with different operating compliance currents was discussed …

Bipolar resistive switching characteristics in tantalum nitride-based resistive random access memory devices

MJ Kim, DS Jeon, JH Park, TG Kim - Applied Physics Letters, 2015 - pubs.aip.org
This paper reports the bipolar resistive switching characteristics of TaN x-based resistive
random access memory (ReRAM). The conduction mechanism is explained by formation …

High-performance polycrystalline-silicon nanowire thin-film transistors with location-controlled grain boundary via excimer laser crystallization

CL Wang, IC Lee, CY Wu, CH Chou… - IEEE electron device …, 2012 - ieeexplore.ieee.org
High-performance polycrystalline-silicon (poly-Si) nanowire (NW) thin-film transistors (TFTs)
are demonstrated using excimer laser crystallization to control the locations of grain …

Improvement of Resistive Switching Characteristics by Thermally Assisted Forming Process for -Based Structure

YT Chen, TC Chang, PC Yang… - IEEE electron device …, 2013 - ieeexplore.ieee.org
After high-temperature forming (HTF) and room-temperature forming treatments, the resistive
switching behavior gets some improvements. The switching ratio is enhanced as the device …