The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

Atmospheric pressure plasma jets are efficient sources of reactive oxygen and nitrogen
species with potential applications in medicine, materials processing, green industry and …

Due to its advantages of spatial uniformity and ion energy control, a dual-frequency (DF)
capacitive-coupled plasma is widely used in semiconductor etching and deposition …

A fluid model is used to calculate plasma density in radiofrequency capacitively coupled
plasmas (RF-CCPs), assuming geometrically symmetric Ar/CF 4. Electrodes are powered by …

This work proposes to use the Ar+ ion beam (IB) injection to modulate the properties of the
single-frequency capacitively coupled plasma (CCP). The particle-in-cell/Monte Carlo …

The development of real-time control strategies for key discharge parameters, such as
densities, fluxes, and energy distributions, is of fundamental interest to many plasma …

Capacitively coupled plasma (CCP) is widely used in plasma etching and deposition
processes because of its low cost, simple structure, and easy generation of a uniform …

The development of compact, low power, charge–neutral propulsion sources is of significant
recent interest due to the rising application of micro-scale satellite platforms. Among such …

The use of non-sinusoidal waveforms in low pressure capacitively coupled plasmas
intended for microelectronics fabrication has the goal of customizing ion and electron energy …

Capacitively coupled plasma is investigated kinetically utilizing the particle-in-cell technique.
The argon (Ar) plasma is generated via two radio frequencies. The plasma bulk density …