Direct CVD growth of graphene on traditional glass: methods and mechanisms
Chemical vapor deposition (CVD) on catalytic metal surfaces is considered to be the most
effective way to obtain large‐area, high‐quality graphene films. For practical applications, a …
effective way to obtain large‐area, high‐quality graphene films. For practical applications, a …
Plasma-chemical reactions: low pressure acetylene plasmas
J Benedikt - Journal of Physics D: Applied Physics, 2010 - iopscience.iop.org
Reactive plasmas are a well-known tool for material synthesis and surface modification.
They offer a unique combination of non-equilibrium electron and ion driven plasma …
They offer a unique combination of non-equilibrium electron and ion driven plasma …
[图书][B] Nonthermal plasma chemistry and physics
J Meichsner, M Schmidt, R Schneider, HE Wagner - 2013 - api.taylorfrancis.com
Plasma processing is one of the key technologies worldwide, especially using nonthermal,
low-temperature plasmas. Recently, the situation is characterized by the fast-growing …
low-temperature plasmas. Recently, the situation is characterized by the fast-growing …
Plasma techniques for nanostructured carbon materials synthesis. A case study: carbon nanowall growth by low pressure expanding RF plasma
S Vizireanu, SD Stoica, C Luculescu… - Plasma Sources …, 2010 - iopscience.iop.org
A short description of approaches for carbon nanostructures synthesis is made and the
advantages of using plasma during the growth are presented. As a particular example of a …
advantages of using plasma during the growth are presented. As a particular example of a …
Some aspects of reactive complex plasmas
Reactive plasmas are nowadays widely used for technological applications. The
spontaneous formation and growth of dust is a phenomenon frequently observed in such …
spontaneous formation and growth of dust is a phenomenon frequently observed in such …
Surface morphology and chemical microstructure of glow discharge polymer films prepared by plasma enhanced chemical vapor deposition at various Ar/H2 ratios
G Chen, X Ai, L Zhang, Y Liu, T Wang, J Huang, J Li… - Vacuum, 2022 - Elsevier
Glow discharge polymer were selected as ablators for inertial confinement fusion
experiments. In order to improve the surface smoothness, Ar was added to the T 2 B/H 2 …
experiments. In order to improve the surface smoothness, Ar was added to the T 2 B/H 2 …
Modeling of argon–acetylene dusty plasma
IB Denysenko, E von Wahl, S Labidi… - Plasma Physics and …, 2018 - iopscience.iop.org
The properties of an Ar/C 2 H 2 dusty plasma (ion, electron and neutral particle densities,
effective electron temperature and dust charge) in glow and afterglow regimes are studied …
effective electron temperature and dust charge) in glow and afterglow regimes are studied …
Temperature dependence of nucleation and growth of nanoparticles in low pressure Ar/CH4 RF discharges
J Beckers, WW Stoffels… - Journal of Physics D …, 2009 - iopscience.iop.org
The gas temperature (T g) dependence of nucleation and growth processes of hydrocarbon
nanoparticles in low pressure Ar/CH 4 RF discharges has been investigated. Measuring the …
nanoparticles in low pressure Ar/CH 4 RF discharges has been investigated. Measuring the …
Plasma properties and discharging of dust particles in an Ar/C2H2 plasma afterglow
IB Denysenko, M Mikikian… - Journal of Physics D …, 2024 - iopscience.iop.org
A global (volume averaged) model is developed for an argon-acetylene plasma afterglow.
The model is used to study the electron and ion densities, electron temperature and …
The model is used to study the electron and ion densities, electron temperature and …
Complex plasma afterglow
L Couëdel, A Mezeghrane, AA Samarian… - … to Plasma Physics, 2009 - Wiley Online Library
In complex plasmas, dust particles are charged through their interactions with the electrons
and the ions of the surrounding plasma. In laboratory discharges, when the discharge is …
and the ions of the surrounding plasma. In laboratory discharges, when the discharge is …