Chloride-based CVD growth of silicon carbide for electronic applications

H Pedersen, S Leone, O Kordina, A Henry… - Chemical …, 2012 - ACS Publications
Silicon carbide (SiC) is a fascinating material. In one way, it is very simple; there are only two
atoms building up the crystal—silicon and carbon, where each atom is sp3-hybridized and …

Evolution of epitaxial graphene layers on 3C SiC/Si (1 1 1) as a function of annealing temperature in UHV

B Gupta, M Notarianni, N Mishra, M Shafiei, F Iacopi… - Carbon, 2014 - Elsevier
The growth of graphene on SiC/Si substrates is an appealing alternative to the growth on
bulk SiC for cost reduction and to better integrate the material with Si based electronic …

[HTML][HTML] Genesis and evolution of extended defects: The role of evolving interface instabilities in cubic SiC

G Fisicaro, C Bongiorno, I Deretzis… - Applied Physics …, 2020 - pubs.aip.org
Emerging wide bandgap semiconductor devices such as the ones built with SiC have the
potential to revolutionize the power electronics industry through faster switching speeds …

Growth of 3C–SiC on 150-mm Si (100) substrates by alternating supply epitaxy at 1000 C

L Wang, S Dimitrijev, J Han, A Iacopi, L Hold, P Tanner… - Thin solid films, 2011 - Elsevier
To lower deposition temperature and reduce thermal mismatch induced stress,
heteroepitaxial growth of single-crystalline 3C–SiC on 150 mm Si wafers was investigated at …

Epitaxial graphene on cubic SiC (111)/Si (111) substrate

A Ouerghi, A Kahouli, D Lucot, L Travers… - Applied physics …, 2010 - pubs.aip.org
Epitaxial graphene films grown on silicon carbide (SiC) substrate by solid state
graphitization is of great interest for electronic and optoelectronic applications. In this paper …

Demonstration of p-type 3C–SiC grown on 150 mm Si (1 0 0) substrates by atomic-layer epitaxy at 1000 C

L Wang, S Dimitrijev, J Han, P Tanner, A Iacopi… - Journal of Crystal …, 2011 - Elsevier
The potential for enhancement of Si-based devices by growth of SiC films on large-diameter
Si wafers is hampered by the very high temperatures (close to the Si melting temperature) …

Advanced residual stress analysis and FEM simulation on heteroepitaxial 3C–SiC for MEMS application

R Anzalone, G D'arrigo, M Camarda… - Journal of …, 2011 - ieeexplore.ieee.org
SiC is a candidate material for microelectromechanical and nanoelectromechanical
systems, but the high residual stress created during the film grow limits the development of …

Carbonization and transition layer effects on 3C-SiC film residual stress

R Anzalone, G Litrico, N Piluso, R Reitano… - Journal of Crystal …, 2017 - Elsevier
In this work an extended study of the carbonization process of the silicon surface and of a
low temperature transition layer in the temperature rump on the 3C-SiC epitaxial growth has …

[HTML][HTML] Growth of thick [1 1 1]-oriented 3C-SiC films on T-shaped Si micropillars

M Agati, S Boninelli, C Calabretta, F Mancarella… - Materials & Design, 2021 - Elsevier
In this paper we report the morphology and the microstructural properties of thick [1 1 1]-
oriented 3C-SiC films epitaxially grown on T-shaped Si micropillars. This compliant …

Advanced approach of bulk (111) 3C-SiC epitaxial growth

C Calabretta, V Scuderi, C Bongiorno… - Microelectronic …, 2024 - Elsevier
Abstract 3C-SiC films grown on (111) Si substrates exhibit poor crystal quality and
experience wafer cracks and bowing preventing access to bulk growth. This work reports …