This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

Resolution enhancement in advanced optical lithography will reach a new plateau of
complexity at the 32 nm design rule manufacturing node. In order to circumvent the …

Overlay serves as the pivotal performance indicator for lithography tools, and its prompt and
precise measurement significantly underpins the process yield control. At present, diffraction …

A method for measuring overlay in a sample includes obtaining an image of an overlay
target that includes a series of grating stacks each having an upper and lower grating, each …

In semiconductor device manufacturing, optical overlay metrology measures pattern
placement between two layers in a chip with sub-nm precision. Continuous improvements in …

Diffraction-based overlay (DBO) metrology has been successfully introduced to deal with the
tighter overlay control in modern semiconductor manufacturing. Moreover, DBO metrology …

Overlay metrology measures pattern placement between two layers in a semiconductor chip.
The continuous shrinking of device dimensions drives the need to explore novel optical …

Manufacturing semiconductor devices involves deposit ing and patterning several layers
overlaying each other. For example, gate interconnects and gates of an integrated circuit are …

In the semiconductor industry, the demand for more precise and accurate overlay metrology
tools has increased because of the continued shrinking of feature sizes in integrated circuits …

Reducing the size of metrology targets is essential for in-die overlay metrology in advanced
semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) …