[HTML][HTML] Overview of Emerging Semiconductor Device Model Methodologies: From Device Physics to Machine Learning Engines

X Li, Z Wu, G Rzepa, M Karner, H Xu, Z Wu… - Fundamental …, 2024 - Elsevier
Advancements in the semiconductor industry introduce novel channel materials, device
structures, and integration methods, leading to intricate physics challenges when …

Threshold-Voltage Extraction Methods for Atomically Deposited Disordered ZnO Thin-Film Transistors

M Yoon - Materials, 2023 - mdpi.com
In this paper, we present a threshold-voltage extraction method for zinc oxide (ZnO) thin-film
transistors (TFTs). Bottom-gate atomic-layer-deposited ZnO TFTs exhibit typical n-type …

Bias-stress stability of top-gate coplanar a-ITGZO TFTs with HfO2 and HfAlO gate dielectrics

H Kong, K Cho, H Lee, S Lee, J Lim, S Kim - Materials Science in …, 2022 - Elsevier
In this study, we investigated the electrical characteristics of amorphous indium–tin–gallium–
zinc-oxide thin-film transistors (TFTs)(a-ITGZO TFTs) with HfO 2 and HfAlO gate dielectrics …

A compact model of amorphous InGaZnO TFTs to predict temperature-dependent characteristics

A Sharma, PG Bahubalindruni, M Bharti… - IEEE Electron …, 2022 - ieeexplore.ieee.org
In amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs), the conduction mechanism of
percolation and trap-limited conduction prevails within the limits of gate voltage. In these …

Interface scattering dominated carrier transport in hysteresis-free amorphous InGaZnO thin film transistors with high-k HfAlO gate dielectrics by atom layer deposition

T Huang, Y Zhang, H Liu, R Tao, C Luo… - Semiconductor …, 2021 - iopscience.iop.org
In this work, we systematically investigated the carrier transport of hysteresis-free
amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) incorporating high-k (HfO 2) x (Al 2 …

Adaptation and comparative analysis of HSPICE level‐61 and level‐62 model for a‐IGZO thin film transistors

D Dubey, M Goswami, K Kandpal - International Journal of …, 2024 - Wiley Online Library
This paper presents a Computer‐aided design (CAD) model for a‐IGZO thin film transistors
(TFTs) by adapting SPICE level‐61 RPI a‐Si: H (Hydrogenated Amorphous Silicon) TFT …

The clarification of leakage conduction mechanism of HfO2/SiNx stacked a-IGZO TFT and its variation at high temperature

R Wang, J Wang, G Niu, Q Wei, S Wu, C Yu… - Applied Physics …, 2022 - pubs.aip.org
In this paper, the current conduction mechanisms of an a-IGZO thin-film transistor based on
HfO 2/SiN x stacks were investigated at room temperature and its variation at 523 K. Ti/HfO …

Analysis of a-InGaZnO TFT Threshold Voltage Instability and Mobility Boosting by Current Stress at a Cryogenic Temperature

S Lee, J Park, GW Yang, C Kim, SJ Choi… - IEEE Electron …, 2022 - ieeexplore.ieee.org
Device characteristics of amorphous InGaZnO thin film transistors (a-IGZO TFTs) at a
cryogenic temperature () are analyzed including device instability after applying current …

A Universal Core Surface-Potential Modeling Methodology for Future Heterogeneous AOS/Si Co-integrated Design

Y Zhao, J Guo, L Xu, S Huang… - 2022 10th International …, 2023 - ieeexplore.ieee.org
A universal core surface potential modeling methodology is proposed to obtain the
continuous explicit solutions to Poisson equation for future heterogeneous AOS/Si co …

High-performance amorphous indium-gallium-zinc-oxide thin-film-transistor and its applications

Y Li - 2022 - dr.ntu.edu.sg
Indium-Gallium-Zinc-Oxide (IGZO) thin-film transistor (TFT) is an emerging electronic device
with many applications, such as active-matrix high-resolution display, wearable electronics …