High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology
RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
On the application potential of chemically tailored metal oxide and higher chalcogenide nanoparticles for nanoscale resistive switching devices
A Frommelius, T Ohlerth, M Noyong… - physica status solidi …, 2024 - Wiley Online Library
Resistive switching (RS) for nonvolatile data storage is a highly relevant field of research. Up
to now, RS devices are fabricated via semiconductor processing technologies. This poses …
to now, RS devices are fabricated via semiconductor processing technologies. This poses …
Deposition of titanium nitride thin films on stainless steel—AISI 304 substrates using a plasma focus device
A 3.3 kJ pulsed plasma focus device was used to deposit thin films of titanium nitride (TiN) at
room temperature onto the stainless steel—AISI 304 substrates. The small plasma focus …
room temperature onto the stainless steel—AISI 304 substrates. The small plasma focus …
Optimization of the high pressure operation regime for enhanced neutron yield in a plasma focus device
The average total neutron yield is measured, using an indium foil activation detector, at
various combinations of filling gas pressures (including the higher pressure operation …
various combinations of filling gas pressures (including the higher pressure operation …
Effect of energetic ion irradiation on CdI2 films
CdI2 has a layered structure with neighboring layers held by van der Waals forces. Different
stacking sequences of iodine, sandwiching Cd layers, give rise to polytype structures. As …
stacking sequences of iodine, sandwiching Cd layers, give rise to polytype structures. As …
Nano-phase titanium dioxide thin film deposited by repetitive plasma focus: Ion irradiation and annealing based phase transformation and agglomeration
We report the successful deposition of nano-phase crystalline titanium dioxide (TiO2) thin
films using a repetitive plasma focus device on silicon (Si) substrates at room temperature …
films using a repetitive plasma focus device on silicon (Si) substrates at room temperature …
Fabrication and characterization of electrodeposited antimony telluride crystalline nanowires and nanotubes
D Pinisetty, M Gupta, AB Karki, DP Young… - Journal of Materials …, 2011 - pubs.rsc.org
Arrays of nanowires and nanotubes of antimony-telluride (Sb2Te3) have been fabricated by
an electrodeposition technique. Scanning electron microscopy was employed to …
an electrodeposition technique. Scanning electron microscopy was employed to …
Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus
Pulsed laser deposition synthesized ZnO thin films, grown at 400° C substrate temperature
in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions …
in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions …
Pulsed Hot Dense Oxygen Plasma Irradiation of Platinum for Improved Spin Hall Effect
The impurity incorporation in host high spin-orbit coupling materials like platinum (Pt) has
shown improved charge-to-spin conversion efficiency by modifying the up-spin and down …
shown improved charge-to-spin conversion efficiency by modifying the up-spin and down …
Angular distribution of argon ions and X-ray emissions in the APF plasma focus device
Angular distribution of ion beam emission from an argon gas-filled plasma focus devices has
been investigated using an array of five Faraday cups. The argon ion beam emission is …
been investigated using an array of five Faraday cups. The argon ion beam emission is …