The underlying physics of the application of low-temperature, low-pressure reactive plasmas
in various nanoassembly processes is described. From the viewpoint of the “cause and …

An overview of dynamic self-organization phenomena in complex ionized gas systems,
associated physical phenomena, and industrial applications is presented. The most recent …

The following sections are included: Self-organized Plasma-Particle States Dust-plasma
sheath as a self-organized structure Dust voids: observations and main mechanisms …

This article concerns the detailed investigations on the silver dendrite‐assisted growth of
single‐crystalline silicon nanowires, and their possible self‐assembling …

The growth of TiO2 nanorods on a WC–Co substrate by metalorganic chemical vapor
deposition has been observed by SEM and TEM. The nanorods diameter and length were …

We have demonstrated the successful deposition of poly (glycidyl methacrylate)(PGMA) thin
films using hot filament chemical vapor deposition (HFCVD) with tert-butyl peroxide as the …

Carbon materials have emerged as a rapidly advancing category of high-performance
materials that have garnered significant attention across various scientific and technological …

Cross‐sectional samples of silicon nanowires (SiNWs) are examined using transmission
electron microscopy. The cross‐sections are bounded by well‐defined low‐index …

Nanoscale wires of silicon oxide, and silicon oxide with embedded gold-silicide
nanospheres, are synthesized by heating of a gold-coated silicon wafer at temperatures of …

Chemical vapor deposition (CVD) is an established process for the production of thin solid
films for industrial and scientific applications for more than 30 years. CVD is a multiscale …