Atomic Layer Deposition: An Overview | Chemical Reviews ACS ACS Publications C&EN CAS
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Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with
atomic level control of the thickness and an excellent conformality on 3-dimensional …

Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in
nanofabrication. Based on its self-limiting surface reactions, ALD has excellent conformality …

Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to
current nanopatterning techniques. Self-assembled monolayers (SAM) have been …

The move to implement metal oxide based gate dielectrics in a metal-oxide-semiconductor
field effect transistor is considered one of the most dramatic advances in materials science …

The demand for high-performance devices that are used in electrochemical energy
conversion and storage has increased rapidly. Tremendous efforts, such as adopting new …

Atomic layer deposition (ALD) has recently become the method of choice for the
semiconductor industry to conformally process extremely thin insulating layers (high‐k …