[HTML][HTML] Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes
ES Vikulova, SI Dorovskikh, TV Basova, AA Zheravin… - Molecules, 2024 - mdpi.com
This review summarized the developments in the field of volatile silver complexes, which
can serve as precursors in gas-transport reactions for the production of thin films and metal …
can serve as precursors in gas-transport reactions for the production of thin films and metal …
Role of Anionic Backbone in NHC‐Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition
Cu and Ag precursors that are volatile, reactive, and thermally stable are currently of high
interest for their application in atomic‐layer deposition (ALD) of thin metal films. In pursuit of …
interest for their application in atomic‐layer deposition (ALD) of thin metal films. In pursuit of …
Synthesis, characterization and antioxidative capacity of nickel (II) and zinc (II) complexes with 4-methylpyrazole
D Kočović, BB Holló, I Borišev, V Leovac, LV Ješić… - Inorganica Chimica …, 2025 - Elsevier
In this paper, the coordination of 4-methylpyrazole (L) to Ni (II) and Zn (II) ions is studied
through the reactions of Ni (OAc) 2· 4H 2 O and Zn (OAc) 2· 2H₂O with 4-methylpyrazole in …
through the reactions of Ni (OAc) 2· 4H 2 O and Zn (OAc) 2· 2H₂O with 4-methylpyrazole in …
Evaluation of volatility and thermal stability in monomeric and dimeric lanthanide (III) complexes containing enaminolate ligands
Treatment of 3 equiv of the potassium salts derived from the β-amino ketones 1-
(dimethylamino)-3, 3-dimethylbutan-2-one (L1H), 3, 3-dimethyl-1-(pyrrolidin-1-yl) butan-2 …
(dimethylamino)-3, 3-dimethylbutan-2-one (L1H), 3, 3-dimethyl-1-(pyrrolidin-1-yl) butan-2 …
Preparation, characterization, and structural studies of new ruthenium (II) and ruthenium (III) complexes incorporating pyrazole ligands
Y Shi, AM Arif, RD Ernst - Polyhedron, 2021 - Elsevier
Multimetallic complexes containing disparate metals have been established to have
practical utilities. We previously reported a strategy for preparing such species by using …
practical utilities. We previously reported a strategy for preparing such species by using …
Thermal Atomic Layer Deposition Of Titanium Nitride Films: Synthesis And Characterization Of Novel Titanium Precursors
ACU Abesinghe Arachchige - 2021 - digitalcommons.wayne.edu
Due to the continuous miniaturization of microelectronic devices, robust deposition
techniques are required which can provide continuous and conformal thin films even in high …
techniques are required which can provide continuous and conformal thin films even in high …
[图书][B] Thermal Atomic Layer Deposition of Titanium Nitride Films: Synthesis and Characterization of Novel Titanium Precursors
ACUA Arachchige - 2021 - search.proquest.com
Due to the continuous miniaturization of microelectronic devices, robust deposition
techniques are required which can provide continuous and conformal thin films even in high …
techniques are required which can provide continuous and conformal thin films even in high …