Total-ionizing-dose effects in modern CMOS technologies

HJ Barnaby - IEEE transactions on nuclear science, 2006 - ieeexplore.ieee.org
This review paper discusses several key issues associated with deep submicron CMOS
devices as well as advanced semiconductor materials in ionizing radiation environments …

ELDRS in bipolar linear circuits: A review

RL Pease, RD Schrimpf… - … European Conference on …, 2008 - ieeexplore.ieee.org
Enhanced Low Dose Rate Sensitivity (ELDRS) in bipolar linear transistors was first identified
in bipolar microcircuit transistors in 1991 and demonstrated in bipolar linear circuits in 1994 …

Radiation effects in MOS oxides

JR Schwank, MR Shaneyfelt… - … on Nuclear Science, 2008 - ieeexplore.ieee.org
Electronic devices in space environments can contain numerous types of oxides and
insulators. Ionizing radiation can induce significant charge buildup in these oxides and …

Total ionizing dose effects in MOS and low-dose-rate-sensitive linear-bipolar devices

DM Fleetwood - IEEE Transactions on Nuclear Science, 2013 - ieeexplore.ieee.org
An overview is presented of total ionizing dose (TID) effects in MOS and bipolar devices from
a historical perspective, focusing primarily on work presented at the annual IEEE Nuclear …

Review of radiation damage in GaN-based materials and devices

SJ Pearton, R Deist, F Ren, L Liu… - Journal of Vacuum …, 2013 - pubs.aip.org
A review of the effectsof proton, neutron, γ-ray, and electron irradiation on GaN materials
and devices is presented. Neutron irradiation tends to create disordered regions in the GaN …

Radiation hardness assurance testing of microelectronic devices and integrated circuits: Radiation environments, physical mechanisms, and foundations for hardness …

JR Schwank, MR Shaneyfelt… - IEEE Transactions on …, 2013 - ieeexplore.ieee.org
This document describes the radiation environments, physical mechanisms, and test
philosophies that underpin radiation hardness assurance test methodologies. The natural …

Influence of LDD Spacers and H+ Transport on the Total-Ionizing-Dose Response of 65-nm MOSFETs Irradiated to Ultrahigh Doses

F Faccio, G Borghello, E Lerario… - … on Nuclear Science, 2017 - ieeexplore.ieee.org
The degradation induced by ultrahigh total ionizing dose in 65-nm MOS transistors is
strongly gate-length dependent. The current drive decreases during irradiation, and the …

Interface traps, correlated mobility fluctuations, and low-frequency noise in metal–oxide–semiconductor transistors

DM Fleetwood - Applied Physics Letters, 2023 - pubs.aip.org
Interface traps generally are not considered to be likely sources of low-frequency (LF) noise
and/or random telegraph noise (RTN) in metal–oxide–semiconductor (MOS) devices …

Modeling ionizing radiation effects in solid state materials and CMOS devices

HJ Barnaby, ML McLain, IS Esqueda… - IEEE Transactions on …, 2009 - ieeexplore.ieee.org
A comprehensive model is presented which enables the effects of ionizing radiation on bulk
CMOS devices and parasitic structures to be simulated with closed form functions. The …

Effects of bias and temperature on interface-trap annealing in MOS and linear bipolar devices

DM Fleetwood - IEEE Transactions on Nuclear Science, 2022 - ieeexplore.ieee.org
This article reviews the effects of applied bias and temperature on Si/SiO 2 interface-trap
buildup and annealing rates. Electrical and spectroscopic methods are described to …