Directed self-assembly of block copolymers for nanocircuitry fabrication
MA Morris - Microelectronic Engineering, 2015 - Elsevier
This paper is a perspective on progress that has been made in the use of block copolymers
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
Solvent vapor annealing of block polymer thin films
C Sinturel, M Vayer, M Morris, MA Hillmyer - Macromolecules, 2013 - ACS Publications
This Perspective provides a critical analysis of the current knowledge concerning solvent
vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that …
vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that …
Ultrathin random copolymer-grafted layers for block copolymer self-assembly
Hydroxyl-terminated P (Sr-MMA) random copolymers (RCPs) with molecular weights (M n)
from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a …
from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a …
On the Thermal Stability of PS-b-PMMA Block and P(S-r-MMA) Random Copolymers for Nanopatterning Applications
This study addresses the thermal stability and degradation path of symmetric and
asymmetric PS-b-PMMA block copolymers, widely employed to generate templates for …
asymmetric PS-b-PMMA block copolymers, widely employed to generate templates for …
Self-assembly of polystyrene-block-poly (4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured …
Block copolymers (BCPs) are seen as a possible cost effective complementary technique to
traditional lithography currently used in the semiconductor industry. This unconventional …
traditional lithography currently used in the semiconductor industry. This unconventional …
Effect of Grafting Density of Random Copolymer Brushes on Perpendicular Alignment in PS-b-PMMA Thin Films
We modulated the grafting density (σ) of a random copolymer brush of poly (styrene-r-methyl
methacrylate) on substrates to probe its effect on the formation of perpendicularly aligned …
methacrylate) on substrates to probe its effect on the formation of perpendicularly aligned …
Thermal stability of functional P (Sr-MMA) random copolymers for nanolithographic applications
Two strategies are envisioned to improve the thermal stability of the grafted layer and to
allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high …
allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high …
Dewetting behavior of Langmuir−Blodgett films of polystyrene‐b‐poly(methyl methacrylate) induced by solvent vapor annealing
T Wu, G Wen, C Huang - Journal of Polymer Science Part B …, 2016 - Wiley Online Library
In order to explore the degree of contact between hydrophilic blocks and the substrate, the
dewetting behavior of Langmuir–Blodgett (LB) films of polystyrene‐block‐poly (methyl …
dewetting behavior of Langmuir–Blodgett (LB) films of polystyrene‐block‐poly (methyl …
Perpendicular Domain Orientation of Poly(styrene-block-methylmethacrylate (PS-b-PMMA) Thin Films Produced on Zinc Oxide Nanoparticle Layer
Perpendicular di-block copolymer domains are produced when poly (styrene-block-
methylmethacrylate (PS-b-PMMA) is spun onto a disordered layer of zinc oxide …
methylmethacrylate (PS-b-PMMA) is spun onto a disordered layer of zinc oxide …
Nanostructured Thin Films of Moderately Functionalized PMMA‐b‐PS
H Turgut, D Varadharajan… - Macromolecular …, 2018 - Wiley Online Library
A library of poly (methyl methacrylate)‐block‐polystyrene (PMMA‐b‐PS) block copolymers
(BCPs) bearing small amounts (< 10 mol%) of functional comonomer in either one or both …
(BCPs) bearing small amounts (< 10 mol%) of functional comonomer in either one or both …