Effect of the Indium Compositions in Tri-Gate InxGa1− xAs HEMTs for High-Frequency Low Noise Application

C Wang, CN Kuo, YC Lin, HT Hsu… - ECS Journal of Solid …, 2022 - iopscience.iop.org
In this paper, we investigated the tri-gate In x Ga 1− x As high electron mobility transistors
(HEMTs) with different indium compositions for low noise applications. The tri-gate …

Transistors for 100-300GHz Wireless

M Rodwell, B Markman, Y Fang… - … 2021-IEEE 51st …, 2021 - ieeexplore.ieee.org
We examine the potential design and performance of 100–300 GHz wireless
communications systems, examine the required transistors performance, and describe our …

HEMT With Ultralow Contact Resistance by Room Temperature Process With One-Step EBL T-Shape Gates for Subterahertz Applications: Design, Fabrication, and …

H Cheng, J Wang, J Kelly, A Ofiare… - IEEE Transactions on …, 2024 - ieeexplore.ieee.org
We present the design, fabrication, and characterization of InGaAs channel high electron
mobility transistors (HEMTs) with ultralow contact resistance for millimeter-wave and …

[HTML][HTML] Atomic layer deposition of TiN/Ru gate in InP MOSFETs

HY Tseng, Y Fang, WJ Mitchell, AA Taylor… - Applied Physics …, 2021 - pubs.aip.org
InP channel planar and vertical MOSFETs utilizing atomic layer deposition of a TiN/Ru gate
are fabricated. The performance of the TiN/Ru gate is compared to a Ru-only gate based on …

Impact of tapered dielectric on a gallium nitride metal oxide semiconductor high electron mobility transistor (MOSHEMT) towards biosensing applications

A Dastidar, TK Patra - Micro and Nanoelectronics Devices, Circuits and …, 2022 - Springer
This paper presents the sensitivity analysis of an AlGaN/GaN single gate MOSHEMT with a
tapered high-κ dielectric with a cavity under the gate for neutral biomolecules. The device …

Capacitance Scaling in In0.71Ga0.29As/InP MOSFETs With Self-Aligned a:Si Spacers

NS Garigapati, F Lindelöw… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
In 0.71 Ga 0.29 As/InP (12/2 nm) quantum well MOSFETs using sacrificial amorphous silicon
(a: Si) spacers to achieve low parasitic capacitance are fabricated. Radio frequency …

III-V Nanowire MOSFETs: RF-Properties and Applications

LE Wernersson - 2020 IEEE BiCMOS and Compound …, 2020 - ieeexplore.ieee.org
III-V MOSFETs provide improved electrostatic control at scaled gate lengths combined with a
considerable reduction in gate leakage current. Following the natural transistor evolution …

Selective Area Metal Organic Chemical Vapor Deposition Approaches for Novel Electronics and Photonic Integration

ST Suran Brunelli - 2021 - escholarship.org
With the advent of things like autonomous vehicles, augmented reality, high-capacity
wireless networks, and high performance computing, the ways in which we sense, process …

[图书][B] Selective Area Metal Organic Chemical Vapor Deposition Approaches for Novel Electronics and Photonic Integration

STŠ Brunelli - 2021 - search.proquest.com
With the advent of things like autonomous vehicles, augmented reality, high-capacity
wireless networks, and high performance computing, the ways in which we sense, process …

[引用][C] PLEASE CITE THIS ARTICLE AS DOI: 10.1063/5.0058825

HY Tseng, Y Fang, WJ Mitchell, AA Taylor…