Plasmon-driven hot electron transfer at atomically sharp metal–semiconductor nanojunctions

M Sistani, MG Bartmann, NA Güsken, RF Oulton… - ACS …, 2020 - ACS Publications
Recent advances in guiding and localizing light at the nanoscale exposed the enormous
potential of ultrascaled plasmonic devices. In this context, the decay of surface plasmons to …

Copper oxide quantum dot ink for inkjet-driven digitally controlled high mobility field effect transistors

M Vaseem, AR Hong, RT Kim, YB Hahn - Journal of Materials …, 2013 - pubs.rsc.org
Copper oxide (CuO) quantum dots (QDs) having a diameter of 5–8 nm were synthesized by
a simple solution process. The as-synthesized QDs showed a highly crystalline monoclinic …

Electronic Transport Modulation in Ultrastrained Silicon Nanowire Devices

MG Bartmann, S Glassner, M Sistani… - … Applied Materials & …, 2024 - ACS Publications
In this work, we explore the effect of ultrahigh tensile strain on electrical transport properties
of silicon. By integrating vapor–liquid–solid-grown nanowires into a micromechanical …

[PDF][PDF] Nanoscale patterning by AFM lithography and its application on the fabrication of silicon nanowire devices

SD Hutagalung, KC Lew, T Darsono - Sains Malaysiana, 2014 - ukm.my
Many techniques have been applied to fabricate nanostructures via top-down approach
such as electron beam lithography. However, most of the techniques are very complicated …

Electrical characteristics of silicon nanowire transistor fabricated by AFM lithography

SD Hutagalung, KC Lew - 2010 IEEE International Conference …, 2010 - ieeexplore.ieee.org
Atomic force microscope (AFM) nanolithography was performed to create nanowire
transistor pattern via local anodic oxidation process on surface of silicon-on-insulator (SOI) …

Electrical characterization of metal–silicon microwire interface using conductive atomic force microscope

SA Moiz, SW Jee, HD Um, JH Lee - Japanese Journal of Applied …, 2010 - iopscience.iop.org
Ni-catalyzed silicon microwires (SiMWs) were grown on n-Si (111) substrate. The bottom
contacts of the SiMWs were selectively formed using Ni electrodeposition at the substrate …

[PDF][PDF] Effect of TMAH etching duration on the formation of silicon nanowire transistor patterned by AFM nanolithography

TMNMD Atom, SD HUTAGALUNG, K LEW - Sains Malaysiana, 2012 - core.ac.uk
Atomic force microscopy (AFM) lithography was applied to produce nanoscale pattern for
silicon nanowire transistor fabrication. This technique takes advantage of imaging facility of …

Si 纳米线器件及其研究进展

彭英才, 张志刚, 李俊颖, 娄建忠 - 河北大学学报(自然科学版), 2011 - xbzrb.hbu.edu.cn
Si 纳米线是一种新型的准一维纳米半导体材料, 具有独特的电子输运特性,
场发射特性和光学特性等. 本文对利用Si 纳米线制备的各类电子器件, 例如存储器 …

Fabrication of single-nanowire sensing devices by electron beam lithography

M Donarelli, R Milan, M Ferroni, G Faglia… - 2015 XVIII AISEM …, 2015 - ieeexplore.ieee.org
In this paper, we report on the feasibility of single nanowire devices fabrication by electron
beam lithography. SnO 2 and ZnO nanowires bundles have been synthesized by vapor …

Current-voltage characteristics of side-gated silicon nanowire transistor fabricated by AFM lithography

SD Hutagalung, KC Lew - Advanced Materials Research, 2011 - Trans Tech Publ
Silicon nanowire transistor (SiNWT) was fabricated by using a silicon nanowire as a channel
which directly connected to the source (S) and drain (D). In this work, a side gate (G) …