Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with< 100nm …
JV Crivello, E Reichmanis - Chemistry of Materials, 2014 - ACS Publications
Photopolymers broadly comprise monomers, oligomers, polymers, or mixtures of the aforementioned materials that upon exposure to light undergo photochemical reactions that …
W Srituravanich, N Fang, C Sun, Q Luo, X Zhang - Nano letters, 2004 - ACS Publications
In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a …
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts …
Nanoscience is not just physics, chemistry, engineering, or biology, but rather an integration of all of these disciplines. The first comprehensive and interdisciplinary text of its kind …
The escalating cost of next generation lithography (NGL) is driven in part by the need for complex sources and optics. The cost for a single NGL tool could soon exceed $50 million, a …
W Qiao, W Huang, Y Liu, X Li, LS Chen… - Advanced …, 2016 - Wiley Online Library
Continuous and scalable nanopatterning over flexible substrates is highly desirable for both commercial and scientific interests, but is difficult to realize with traditional photolithographic …
VS Khire, Y Yi, NA Clark, CN Bowman - Adv. Mater, 2008 - academia.edu
All monomers were purchased from Sigma Aldrich (Milwaukee, WI) and used as received unless otherwise mentioned. The silanes n-octadecyltriethoxysilane (OTES) and 3 …
T Higashiki, T Nakasugi… - Journal of Micro …, 2011 - spiedigitallibrary.org
Nanoimprint lithography (NIL) has the potential capability of high resolution with critical dimension uniformity that is suited for patterning shrinkage, as well as providing a low cost …