Plasma nanoscience: from nano-solids in plasmas to nano-plasmas in solids

K Ostrikov, EC Neyts, M Meyyappan - Advances in Physics, 2013 - Taylor & Francis
The unique plasma-specific features and physical phenomena in the organization of
nanoscale soild-state systems in a broad range of elemental composition, structure, and …

[HTML][HTML] Block copolymer thin films

C Huang, Y Zhu, X Man - Physics Reports, 2021 - Elsevier
Block copolymer (BCP) represents a special type of polymeric system where each of the
polymer chains is composed of two or more chemically distinct homopolymer blocks that are …

High χ–Low N Block Polymers: How Far Can We Go?

C Sinturel, FS Bates, MA Hillmyer - 2015 - ACS Publications
Block polymers incorporating highly incompatible segments are termed “high χ” polymers,
where χ is the Flory–Huggins interaction parameter. These materials have attracted a great …

Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application

C Cummins, T Ghoshal, JD Holmes… - Advanced …, 2016 - Wiley Online Library
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …

Block copolymer directed metamaterials and metasurfaces for novel optical devices

A Alvarez‐Fernandez, C Cummins… - Advanced Optical …, 2021 - Wiley Online Library
Optical metamaterials are artificially engineered architectures that exhibit desired optical
properties not found in nature. Bespoke design requires the ability to define shape, size …

[HTML][HTML] Plasma etching of the trench pattern with high aspect ratio mask under ion tilting

MY Yoon, HJ Yeom, JH Kim, JR Jeong, HC Lee - Applied Surface Science, 2022 - Elsevier
In this study, we developed a method to qualify the plasma etching result in high-aspect-ratio
trench with ion tilting using the natural sheath curvature at the wafer edge. Etching was …

Directed self-assembly of block copolymers for nanocircuitry fabrication

MA Morris - Microelectronic Engineering, 2015 - Elsevier
This paper is a perspective on progress that has been made in the use of block copolymers
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …

High aspect ratio sub‐15 nm silicon trenches from block copolymer templates

X Gu, Z Liu, I Gunkel, ST Chourou, SW Hong… - Advanced …, 2012 - Wiley Online Library
Photolithgraphy has been the mainstay for meeting the demand for continuous shrinkage in
the semiconductor industry, but it is facing limitations for sub-30 nm patterning.[1] Block …

Plasma meets MOFs: synthesis, modifications, and functionalities

Q Wei, S Xue, W Wu, S Liu, S Li, C Zhang… - The Chemical …, 2023 - Wiley Online Library
As a porous and network materials consisting of metals and organic ligands, metal‐organic
frameworks (MOFs) have become one of excellent crystalline porous materials and play an …

Directed self-assembly of block copolymers for the fabrication of functional devices

C Pinto-Gómez, F Pérez-Murano, J Bausells… - Polymers, 2020 - mdpi.com
Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …